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pro vyhledávání: '"Fanny Mitzscherling"'
Autor:
Sebastian Lehmann, Fanny Mitzscherling, Shiyang He, Jun Yang, Martin Hantusch, Kornelius Nielsch, Amin Bahrami
Publikováno v:
Coatings; Volume 13; Issue 3; Pages: 641
We developed a water-free atomic layer deposition (ALD) process to homogeneously deposit SbOx using SbCl5 and Sb-Ethoxide as precursors, and report it here for the first time. The coating is applied on Bi2Te3 particles synthesized via the solvotherma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1a69e98c235c63d17a356d149c6e5683
