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pro vyhledávání: '"Fanny Mitzscherling"'
Autor:
Sebastian Lehmann, Fanny Mitzscherling, Shiyang He, Jun Yang, Martin Hantusch, Kornelius Nielsch, Amin Bahrami
Publikováno v:
Coatings; Volume 13; Issue 3; Pages: 641
We developed a water-free atomic layer deposition (ALD) process to homogeneously deposit SbOx using SbCl5 and Sb-Ethoxide as precursors, and report it here for the first time. The coating is applied on Bi2Te3 particles synthesized via the solvotherma
Autor:
Lehmann, Sebastian, Mitzscherling, Fanny, He, Shiyang, Yang, Jun, Hantusch, Martin, Nielsch, Kornelius, Bahrami, Amin
Publikováno v:
Coatings (2079-6412); Mar2023, Vol. 13 Issue 3, p641, 10p