Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Fan-qing Jiang"'
Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering
Publikováno v:
Vacuum. 135:93-100
Copper (Cu) has been proposed as a well-known material for metallization in Si-based semiconductor devices because of its low resistivity, high chemical stability, and excellent electromigration resistance. In order to improve the properties of Cu fi
Publikováno v:
Vacuum. 90:50-58
In order to enhance the life of cemented carbide tools for milling Ti6Al4V alloy, Ti(Cr)SiC(O)N (including TiSiCN, TiSiCON, CrSiCN and CrSiCON) coatings were deposited on flat samples for characterization and K40UF cemented carbide end-mills for mill
Publikováno v:
Vacuum. 89:168-173
Three kinds of hard coatings, TiSiCN, TiCrSiCN and CrSiCN were deposited on WC/Co alloys by plasma enhanced magnetron sputtering (PEMS) technique. Those coatings were comparatively studied with respect to their microstructure and mechanical propertie
Publikováno v:
IEEE Transactions on Plasma Science. 40:1829-1836
Diamond coatings present the state-of-the-art surface finish of tools for machining titanium and its alloys. However, the influence of this coating on the wear mechanism has not been elucidated yet. In this paper, ball-on-disc wear tests against 6-mm