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Autor:
Fahlman, Bradley Dean
Deposition of highly conformal alumina thin films onto various substrates was carried out by hydrolysis of AlH3(NMe2Et) in a hot-wall atmospheric pressure chemical vapor deposition (APCVD) system. Optimum growth conditions were at 165°C with a AlH3(
Externí odkaz:
http://hdl.handle.net/1911/19489
Publikováno v:
In Materials Science & Engineering C 1 June 2017 75:1268-1280
