Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Fabien Coursimault"'
Publikováno v:
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics, IOP Publishing, 2003, 36 (17), pp.2060-2066. ⟨10.1088/0022-3727/36/17/307⟩
Journal of Physics D: Applied Physics, IOP Publishing, 2003, 36 (17), pp.2060-2066. ⟨10.1088/0022-3727/36/17/307⟩
UV emission of silicon oxide molecules observed from a non-thermal atmospheric pulsed dielectric barrier discharge was experimentally explored in a spectral range from 228 to 253 nm. The main vibrational bands (1, 1), (2, 2) and (0, 1) of A 1Π–X 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cc14a88060ed1ebe45d3aef0aab361f5
https://doi.org/10.1088/0022-3727/36/17/307
https://doi.org/10.1088/0022-3727/36/17/307
Publikováno v:
Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2006, 100 (9), pp.093301. ⟨10.1063/1.2372315⟩
Journal of Applied Physics, American Institute of Physics, 2006, 100 (9), pp.093301. ⟨10.1063/1.2372315⟩
In this study we present the technique of resonant absorption spectroscopy diagnostic developed to estimate the density of silicon monoxide (SiO) molecules during the postdischarge of an atmospheric dielectric barrier discharge plasma. The ultraviole
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d4ffc5c82afd72e8c8092a6cb1d206df
https://hal.archives-ouvertes.fr/hal-02179079
https://hal.archives-ouvertes.fr/hal-02179079
Publikováno v:
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics, IOP Publishing, 2004, 37 (13), pp.1750-1758. ⟨10.1088/0022-3727/37/13/005⟩
Journal of Physics D: Applied Physics, IOP Publishing, 2004, 37 (13), pp.1750-1758. ⟨10.1088/0022-3727/37/13/005⟩
In this study we have estimated the density of SiO molecules produced in atmospheric dielectric barrier discharges by means of spectroscopic investigations based on the self-absorption diagnostic. The (2, 0), (1, 0) and (0, 0) ro-vibrational bands of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7c684180da61942b278c5467d03ed82c
https://hal.archives-ouvertes.fr/hal-02179076
https://hal.archives-ouvertes.fr/hal-02179076
Publikováno v:
Journal de Physique IV Proceedings
Journal de Physique IV Proceedings, EDP Sciences, 2001, 11 (PR7), pp.Pr7-187-Pr7-188. ⟨10.1051/jp4:2001757⟩
Journal de Physique IV Proceedings, EDP Sciences, 2001, 11 (PR7), pp.Pr7-187-Pr7-188. ⟨10.1051/jp4:2001757⟩
Cette etude s'inscrit dans le cadre de la mise au point d'une technique de mesure de densite absolue de la molecule SiO, cette derniere intervenant dans la physico-chimie des traitements de film polymere par plasma. Le diagnostic developpe est base s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::37e8001dd8bee3dd75e2fdad6c60543b
https://hal.archives-ouvertes.fr/hal-02179038
https://hal.archives-ouvertes.fr/hal-02179038