Fluorescence Interference Contrast-enabled structures improve the microarrays performance

Autor: Prasad Shetty, Dan V. Nicolau, S. Dobroiu, F.C.M.J.M. van Delft, J. Aveyard-Hanson

Publikováno v: Biosensors and Bioelectronics. 123:251-259

Continuous improvements of the fluorescence-based sensitivity and specificity, required for high throughput screening, diagnostics, and molecular biology studies, are usually addressed by better readout systems, or better reporting elements. However,

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7d87b8c17bd7f5a164a2a4f912aa429c
https://doi.org/10.1016/j.bios.2018.09.009

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Manufacturing substrate nano-grooves for studying cell alignment and adhesion

Autor: X. F. Walboomers, W. A. Loesberg, J. te Riet, J.J.W.A. van Loon, Peter Schön, John A. Jansen, Carl G. Figdor, Sylvia Speller, F.C.M.J.M. van Delft, F.C. van den Heuvel

Publikováno v: Microelectronic Engineering, 85, 1362-1366
Microelectronic Engineering, 85, 5-6, pp. 1362-1366
Microelectronic Engineering, 85(5-6), 1362-1366. Elsevier
Microelectronic engineering, 85(5-6), 1362-1366. Elsevier
Delft, F C M J M, van den Heuvel, F C, Loesberg, W A, te Riet, J, Schön, P, Figdor, C G, Speller, S, van Loon, J J W A, Walboomers, X F & Jansen, J A 2008, ' Manufacturing substrate nano-grooves for studying cell alignment and adhesion ', Microelectronic engineering, vol. 85, no. 5-6, pp. 1362-1366 . https://doi.org/10.1016/j.mee.2008.01.028

Nano-scale pattern templates have been manufactured in order to study the differences in cell behaviour between fibroblasts cultured on smooth and on grooved substrata. The pattern templates were made on silicon wafers using electron beam lithography

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b3e1347eb6fae1408d718855012e86fb
https://doi.org/10.1016/j.mee.2008.01.028

Silicon-containing copolymers of MMA tested for a positive-tone high-resolution bi-layer e-beam resist system

Autor: S. van den Boogaart, J. Maessen, F.C.M.J.M. van Delft, J. G. Kloosterboer, W. Catsburg, F. H. P. M. Habraken, E. J. K. Verstegen

Publikováno v: Microelectronic Engineering. :540-545

Copolymers of methylmethacrylate (MMA) and trimethylsilyl-methylmethacrylate (SiMMA) in various molar ratios have been synthesised and characterised for use as a resist in electron beam lithography. The development procedure has been optimised in ter

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e6e12c1a30fece7d55cc40ede22223f6
https://doi.org/10.1016/j.mee.2004.12.068

Nanoscale electrode gaps to study single molecule conduction

Autor: E. F. M. J. van Thiel, R. G. R. Weemaes, Jaap Snijder, Dan V. Nicolau, F.C.M.J.M. van Delft, H. van Zalinge

Publikováno v: Microelectronic Engineering. 88:2707-2709

The fabrication of electrode pairs with a small electrode gap separation using a focussed-ion-beam is reported. Using a previously developed technique, the gap between the electrodes was bridged using several benzenedimethanethiol molecules and a sin

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a25f9e4336849ea9570a9959ef9f3d03
https://doi.org/10.1016/j.mee.2010.12.095