Zobrazeno 1 - 5
of 5
pro vyhledávání: '"F. Y. Robb"'
Publikováno v:
APEC 2001. Sixteenth Annual IEEE Applied Power Electronics Conference and Exposition (Cat. No.01CH37181).
Load dump protection in 42 V automotive systems can be provided by combining the use of both active control and passive transient voltage suppression devices (TVS). TVS devices currently available for automotive systems are analyzed and evaluated aga
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a462cf1438b643d20d47d92c352db110
https://doi.org/10.1109/apec.2001.911662
https://doi.org/10.1109/apec.2001.911662
Autor:
F. Y. Robb
Publikováno v:
Journal of The Electrochemical Society. 131:2906-2911
L'anisotropie de la gravure est essentielle pour utiliser les proprietes de la grille de faible resistance dans les dispositifs MOS reduits a l'echelle. Gravure de couches minces de composites siliciure de titane/silicium polycristallin par plasmas d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1f80ce2d12bf3f2e51503a560dd6a8e7
https://doi.org/10.1149/1.2115440
https://doi.org/10.1149/1.2115440
Autor:
F. Y. Robb
Publikováno v:
Journal of The Electrochemical Society. 131:1670-1674
Les plasmas d'hydrogene employes pour la gravure ionique reactive permettent une gravure anisotrope, mais avec des vitesses d'attaque relativement lentes (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::efa7b6e335fc8fcfa613aaafb67fe627
https://doi.org/10.1149/1.2115934
https://doi.org/10.1149/1.2115934
Publikováno v:
Surface and Colloid Science in Computer Technology ISBN: 9781461290605
Microelectronic device fabrication currently relies totally upon photoresist processing for pattern delineation in integrated circuit fabrication. Adhesion of polymeric photoresist patterns, especially those of submicron dimensions, to the various su
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c8abcdcfc0795ea5a4ac1eb46e73855
https://doi.org/10.1007/978-1-4613-1905-4_7
https://doi.org/10.1007/978-1-4613-1905-4_7
Autor:
W. S. Glaunsinger, F. Y. Robb
Publikováno v:
The Journal of Physical Chemistry. 84:1176-1176
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e896f446fafd4108a8a87dda58aed5e3
https://doi.org/10.1021/j100447a021
https://doi.org/10.1021/j100447a021