Zobrazeno 1 - 10
of 93
pro vyhledávání: '"F. W. Zhu"'
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Autor:
G. H. Yu, A. R.1 guanghua_yu@263.net, F. W. Zhu, A. R.1, M. H. Li1, H. W. Jiang, A. R.2, W. Y. Lai, A. R.2
Publikováno v:
Applied Physics A: Materials Science & Processing. 2004, Vol. 78 Issue 8, p1229-1233. 5p.
Publikováno v:
Journal of University of Science and Technology Beijing, Mineral, Metallurgy, Material. 15:618-621
Magnetic Co-P thin films were prepared by electroless deposition. The experiment results show that the film thickness has a significant influence on the coercivity. While the film thickness varied from 300 nm to 5 μm, the coercivity dropped sharply
Publikováno v:
Modern Physics Letters B. 22:1893-1902
The segregation of Cu atoms in the Cu/Ni multilayers was investigated by means of the full-potential linearized augmented plane-wave method with the generalized-gradient approximation formula. We investigated the segregation of Cu atoms when the Cu/N
Publikováno v:
Thin Solid Films. 516:2058-2062
The fine structures of the electron energy-loss spectra (EELS) for the B-K edge have been examined in NbB2 and superconducting Nb0.75Mg0.25B2. The experimental results are analyzed based on the calculations of density functional theory (DFT) using th
Publikováno v:
Acta Metallurgica Sinica (English Letters). 19:235-243
Ta/NiFe/Bi (Ag, Cu)/FeMn/Ta and Ta/NiFe 1 /FeMn/Bi(Ag, Cu)/NiFe n /Ta films were prepared by magnetic sputtering. The texture and the dependences of the exchange-coupling field on the thickness of Bi, Ag, and Cu in Ta/NiFe/Bi(Ag, Cu)/FeMn/Ta and Ta/N
Publikováno v:
Thin Solid Films. 484:208-214
Ta/Fe-81(19), Ni81Fe19/Ta, CuNi81Fe19, and Ni81Fe19/Cu structures are commonly used in the magnetic multilayers with giant magnetoresistance. For a Ta/Ni81Fe19/Ta fundamental structure, Ta seed and Ta cap layers result in a loss of moment equivalent
Publikováno v:
Journal of Physics D: Applied Physics. 36:4-8
Effect of Ta and Cu seed layers, as well as Ta and Cu cap layers on the effective magnetic thickness of ultrathin permalloy (Ni81Fe19) were experimentally investigated for magnetic random access memory applications. The films were deposited by magnet
Publikováno v:
Journal of Applied Physics. 92:2620-2623
Two sets of NiFe/FeMn films with Ta and Ta/Cu buffer layers were prepared by magnetron sputtering. Results show that the exchange bias field of NiFe/FeMn films with a Ta/Cu buffer is lower than that of the films with a Ta buffer. The crystalline text
Publikováno v:
Journal of Applied Physics. 91:3759-3763
Experimental results show that the exchange coupling field (Hex) of NiFe/FeMn for Ta/NiFe/FeMn/Ta multilayers is higher than that for spin-valve multilayers Ta/NiFe/Cu/NiFe/FeMn/Ta. In order to find out the reason, the composition and chemical states