Characterization of negative tone photoresist mr-EBL 6000.5 for i-line stepper and electron beam lithography for the Intra-Level Mix & Match Approach

Autor: S. Schermer, C. Helke, M. Reinhardt, S. Hartmann, F. Tank, J. Wecker, G. Heldt, A. Voigt, D. Reuter

Publikováno v: Micro and Nano Engineering, Vol 23, Iss , Pp 100264- (2024)

In this paper the characterization of the mr-EBL 6000.5, which is an epoxy resin based chemically amplified negative tone resist from micro resist technology (Germany, Berlin) for an Intra-Level Mix & Match (ILM&M) approach is presented. The ILM&M ap

Externí odkaz: https://doaj.org/article/85b67882f0a44dc19ef28076d355b3a3

Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.

Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.

Technology and culture

Autor: F, TANK

Publikováno v: Chimia. 1(2)

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=pmid________::e2063a60f94ca3826f684241230e9c14
https://pubmed.ncbi.nlm.nih.gov/20242386

Development of software system on dike safety assessment

Autor: S Aguilar Bobadilla, F Aureli, A Maranzoni, P Mignosa, C Ziveri, Y Avdeyeva, D Burakov, V Kosmakova, V Romasko, A Adamovich, I Rusanov, S Ali awan, A Bahremand, J Corluy, Y Liu, F De Smedt, J Poórová, L Velcická, F Berben, F Tank, H Betts, E Sterling, S Clark, Wu Daoxi, Wang Jingquan, P Blommaart, L Wentholt, G Moser, P Burek, S Rademacher, K Wilke, E Chbab, H Buiteveld, C Geerse, E Cheng, S Ojiri, S Myagkov, V Chub, Y Huang, J de Kok, M Doomen, E Wijma, J Zwolsman, H Middelkoop, P Franken, S Flos, Shoji Fukuoka, Yasushi Tanioka, S Mergenthaler, G Bontron, D Coeur, J Gautier, J Peters, M Markar, M Gooda, Min Yaowu, Huang Wei, Zhang Fang Wei, J Götzinger, U Ehret, A Bárdossy, T Gubareva, B Gartsman, C Vermeulen, F Havinga, M Hammer, Minjiao Lu, Norio Hayakawa, Kazuo Takashim, S Hommes, H Otter, S Hulscher, H Huizinga, H Barneveld, I Solheim, S Solbø, N Hunter, P Bates, M Horritt, M Wilson, Md Badrul Islam, Md Sultan-Ul-Islam, R Jüpner, M Tzschirner, M Kawasaki, M Murase, K Wada, Y Tomizawa, N Yasuda, Nguyen Phi Khu, Gerrit Klaassen, Krystian Pilarczyk, V Cong San, M Kolkman, A van der Veen, M Kok, A Kron, O Evdakov, F Nestmann, E Langkamp, B Pengel, C de Gooijer, J Flikweert, B Lin, J Wicks, R Falconer, O Batelaan, Liu Heng, Liu Yu-ling, Wei Wen-li, M Mahboob-ul-Kabir, S Mahbubur Rahman, Md Sharful Alam, T Malone, W Shallcross, Chen Yali, Herman van der Most, Marcel van der Doef, Na Li, D Nohara, P Smith, T Kojiri, A Paquier, J Renzoni, A Cogoluègnes, G Pender, N Wright, M van der Doef, M Ritzen, M Carolina Rogeliz, Erik Mosselman, M Rubarenzya, P Willems, J Berlamont, J Feyen, S van Schijndel, P Sklenar, K Mares, I Maresova, R Slomp, R Spolwind, K Hebenstreit, M Bachhiesl, J Precht, Jinyong Zhao, Dongya Sun, Yongjian Huang, Hiroshi Takebayash, Takeshi Okabe, P Waarts, A Vrouwenvelde, null Wang, Y Chang, J Huang, Q Xi, Q Yan, I Villanueva, M Yamashita, T Tateishi, A Ichikawa, M Zagonjolli, A Mynett, A Verwey, Xu Zeping

Publikováno v: Floods, from Defence to Management: Symposium Proceedings of the 3rd International Symposium on Flood Defence, Nijmegen, The Netherlands, 25-27 May 2005, Book + CD-ROM

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6d9ac30efffacce83ea6b33a3678bdb1
https://doi.org/10.1201/9781439833513.axa