Zobrazeno 1 - 1
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pro vyhledávání: '"F. T. Hartley"'
Publikováno v:
Microsystem Technologies
Microsystem Technologies, Springer Verlag, 2003, 9, pp.409-412
Microsystem Technologies, Springer Verlag, 2003, 9, pp.409-412
The capacity of chemically-assisted focused ion beam (FIB) etching systems to undertake direct and highly anisotropic erosion of thin and thick gold (or other high atomic number {Z}) coatings on X-ray mask membranes/substrates provides new levels of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::54c626dbd77d05b3348ce95353b645e1
https://doi.org/10.1007/s00542-002-0215-5
https://doi.org/10.1007/s00542-002-0215-5
