Zobrazeno 1 - 2
of 2
pro vyhledávání: '"F. S. Schulze"'
Autor:
J.P. Stoquert, E. Laemmer, Aline Deruyver, Liam McDonnell, F. S. Schulze, P. Kern, A. Golanski, Fabrice Piazza
Publikováno v:
Journal of Applied Physics. 93:5911-5919
A distributed electron cyclotron resonance plasma reactor powered by a microwave generator operating at 2.45 GHz was used to deposit a-C:H films at room temperature on rf biased 〈100〉 Si substrates. Modifying substrate bias, substrate current den
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f795574d3654839197681692ec1d7c9
https://doi.org/10.1063/1.1567060
https://doi.org/10.1063/1.1567060
Autor:
I. V. Yurgelevich, I. Yu. Prylutskyy, Jacek Ulanski, F. S. Schulze, P. Scharff, O. P. Dmytrenko, M. P. Kulish, E. M. Shpilevskyy, Michael Hietschold, L. V. Poperenko
Publikováno v:
Hydrogen Materials Science and Chemistry of Carbon Nanomaterials ISBN: 9781402026683
Nanostructure and optical conductivity of single-emulsion Cu-C60 films in the wide temperature range and time of annealing are studied in detail. The essential reconstruction of electronic spectra and spectral dependence of optical conductivity in co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::feb8d30f92c7ea456933cd1dce79d38e
https://doi.org/10.1007/1-4020-2669-2_37
https://doi.org/10.1007/1-4020-2669-2_37
