Zobrazeno 1 - 10
of 10
pro vyhledávání: '"F. L. Pedrotti"'
Publikováno v:
Journal of Applied Physics. 77:3919-3926
Deep level transient spectroscopy (DLTS) and temperature‐dependent Hall effect measurements were performed on undoped, n‐, and p‐type GaAs doped with Er either by ion implantation or during molecular beam epitaxial (MBE) crystal growth. For lig
Publikováno v:
Journal of Applied Physics. 51:5781-5784
The electrical properties of GaAs, doubly implanted with Ge+Ga, have been studied by the van der Pauw–Hall‐effect/sheet‐resistivity technique. In all cases both species of the dual implants were implanted sequentially at the same ion energy of
Autor:
F. L. Pedrotti, D. R. Matthys
Publikováno v:
American Journal of Physics. 50:990-995
An experiment using a standard Michelson interferometer and a microcomputer to produce and display Fourier transform spectrograms in the advanced undergraduate laboratory is described. Fourier transforms of laser and mercury light sources, as well as
Publikováno v:
Journal of Applied Physics. 53:6148-6153
Publikováno v:
Physical Review B. 1:4784-4791
A comparison between the ultraviolet-reflectivity spectrum and the characteristic energy-loss spectrum of ZnO has been carried out. Reflectivity measurements made over an energy range of band gap to 22 eV yielded a spectrum with structure at 3.34, 5.
Autor:
R. L. Hengehold, F. L. Pedrotti
Publikováno v:
Physical Review B. 6:3026-3031
Autor:
R. L. Hengehold, F. L. Pedrotti
Publikováno v:
Journal of Applied Physics. 46:5202-5204
Ultraviolet reflectivity and reflection electron‐energy‐loss techniques have been used to determine the higher energy excitation spectra of the ternary compounds AgGaS2 and CuGaS2. The ultraviolet reflectivity spectra were obtained over the energ
Publikováno v:
Journal of Applied Physics. 53:1815-1817
A comparative study of secondary ion mass spectrometry (SIMS) atomic profiles and electrical profiles for S‐implanted GaAs has been made. For all doses, the electrical profiles are in good agreement with the SIMS profiles in the deep side of the sa
Publikováno v:
Applied Physics Letters. 35:197-199
The electrical properties of Ge‐implanted GaAs have been studied. Room‐temperature implantation was performed at 120 keV with doses ranging from 5×1012 to 3×1015/cm2. Implanted samples were annealed with pyrolytic Si3N4 encapsulants at temperat
Autor:
F. L. Pedrotti, D. C. Reynolds
Publikováno v:
Physical Review. 127:1584-1586