Zobrazeno 1 - 2
of 2
pro vyhledávání: '"F. J. Rauner"'
Publikováno v:
Journal of Applied Polymer Science. 15:513-518
A series of new light-sensitive polysulfonate copolymers have been prepared by the interfacial polycondensation of mixed bisphenols and aromatic disulfonyl chlorides. The light-sensitivity bisphenols contain the styryl ketone group. These polymers ex
Publikováno v:
Journal of Vacuum Science and Technology. 19:1348-1350
A novel negative‐working electron/x‐ray resist with high sensitivity, high resolution, and good dry etch resistance was obtained by the free radical copolymerization of an unsaturated methacrylate and a hydroxy alkyl methacrylate. Depending on th