Zobrazeno 1 - 9
of 9
pro vyhledávání: '"F. J. Ciuba"'
Autor:
P. A. Grudowski, J. E. Fouquet, Archie L. Holmes, F. J. Ciuba, Russell D. Dupuis, J. G. Neff, M.R. Islam, R.V. Chelakara, K. G. Fertitta
Publikováno v:
Journal of Electronic Materials. 24:787-792
AlGaAs double heterostructures are grown by low-pressure metalorganic chemical vapor deposition to evaluate the level of oxygen contamination in different trimethylaluminum sources. Effects of arsine purifiers, misoriented substrates, atmospheric exp
Publikováno v:
Journal of Electronic Materials. 24:257-261
In this paper, we describe the growth and characterization of high-quality GaN heteroepitaxial films grown on basal-plane sapphire substrates using metalorganic chemical vapor deposition. The quality of these films is analyzed by a variety of methods
Publikováno v:
Journal of Crystal Growth. 145:746-751
GaP/InGaP and GaP/GaAsP strained-layer quantum well (QW) structures with 3.0-5.0 nm thick well layers in the direct gap region were grown on GaP substrates by metalorganic chemical vapor deposition (MOCVD) using triethylgallium (TEGa) and ethyldimeth
Autor:
R.V. Chelakara, M.R. Islam, Russell D. Dupuis, J. G. Neff, F. J. Ciuba, Archie L. Holmes, K. G. Fertitta
Publikováno v:
Journal of Crystal Growth. 145:179-186
In this paper, we present results of studies of high-quality InGaP quantum well (QW) heterostructures grown by metalorganic chemical vapor deposition (MOCVD). The QWs have been grown on GaAs: Si substrates having orientations of both (100) and (100)-
Autor:
J. G. Neff, P. A. Grudowski, R. V. Chelakara, K. G. Fertitta, F. J. Ciuba, Russell D. Dupuis, M.R. Islam, Archie L. Holmes
Publikováno v:
Proceedings of IEE/LEOS Summer Topical Meetings: Integrated Optoelectronics.
Autor:
R. V. Chelakara, F. J. Ciuba, M.R. Islam, Nick Holonyak, Russell D. Dupuis, E. I. Chen, Steven A Maranowski, M. J. Ries, Archie L. Holmes
Publikováno v:
Applied Physics Letters. 66:2831-2833
The growth and fabrication of high‐quality vertical distributed Bragg reflectors (DBRs) utilizing layers of InAlP and the AlAs native oxide are reported. The III–V epitaxial structures employed in this work consist of alternating layers of InAlP
Publikováno v:
Applied Physics Letters. 65:1823-1825
We report the growth of high‐quality GaN heteroepitaxial films on (0001) sapphire substrates by low‐pressure metalorganic chemical vapor deposition. These films have exhibited narrow x‐ray‐diffraction rocking curves with full‐width‐at‐h
Autor:
K. G. Fertitta, T. A. Richard, J. G. Neff, K. C. Hsieh, M.R. Islam, Nick Holonyak, R. V. Chelakara, Russell D. Dupuis, F. J. Ciuba, Archie L. Holmes
Publikováno v:
Applied Physics Letters. 65:854-856
The growth and laser operation of high‐quality InAlP‐InGaP superlattice‐active‐region quantum‐well heterostructure lasers on GaAs substrates are reported. These heterostructures exhibit cw room‐temperature (300 K) optically pumped laser o
Publikováno v:
Electronics Letters. 30:1252-1254
The authors report the growth and characterisation of high-quality GaN films grown on (0001)-oriented sapphire (Al2O3) substrates by metal organic chemical vapour deposition (MOCVD). These films were analysed using five-crystal X-ray diffraction, opt