Zobrazeno 1 - 10
of 362
pro vyhledávání: '"F. F. Komarov"'
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 18, Iss 3, Pp 88-96 (2020)
The paper is dedicated to investigation of the influence of rapid thermal treatment on the microstructure of platinum silicide. The Pt films 43.7 nm thick were applied on the substrates of the monocrystal silicon by means of the magnetronic sputterin
Externí odkaz:
https://doaj.org/article/f20f214e189546aa8254526220bdc96d
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 18, Iss 2, Pp 105-111 (2020)
The paper is purposed to establish the principles of the micro-structural changes of Pt-Si system during the rapid thermal treatment. The Pt films 43.7 nm thick were applied on the substrates of mono-crystal silicon KEF 0.5 with orientation (111) by
Externí odkaz:
https://doaj.org/article/08c549cc8af84c598d7810a0cd5c5899
Publikováno v:
Pribory i Metody Izmerenij, Vol 7, Iss 3, Pp 279-285 (2016)
Transition of the precision engineering and instrumentation to the widespread use of nanoscale structures and thin layers requires improved localization methods for measuring the depth of the material. Unified standards and the generally accepted met
Externí odkaz:
https://doaj.org/article/a0f01de96003467d8df960a6304003fe
Publikováno v:
Informatika, Vol 0, Iss 3, Pp 52-61 (2016)
A model describing the space-time evolution of the charge which arises in the dielectric struc-ture of metal-insulator-semiconductor under ionizing radiation of X-ray and gamma-rays is consi-dered. The system of equations is solved by the numerical m
Externí odkaz:
https://doaj.org/article/0235897776f04273bf3439a8be607ca6
Publikováno v:
Pribory i Metody Izmerenij, Vol 6, Iss 2, Pp 139-147 (2015)
It is known that the discharge parameters and the chemical composition of the particles flux impinging onto the substrate during a reactive magnetron sputtering are unstable. As a result spontaneous transitions between the «metal» mode of the targe
Externí odkaz:
https://doaj.org/article/d91393a6aedd4cad894ee5b159aaf12c
Publikováno v:
Pribory i Metody Izmerenij, Vol 0, Iss 1, Pp 37-40 (2015)
Various modifications of complex pulsed laser and magnetron deposition thin-film structures unit are presented. They include joint and separate variants of layer deposition. Unit realizes the plasma parameters control and enhances the possibility of
Externí odkaz:
https://doaj.org/article/031c124fd2514e8eae993251fcee69db
Publikováno v:
Pribory i Metody Izmerenij, Vol 0, Iss 1, Pp 17-22 (2015)
A measuring complex for quantitative analysis of element contents and distributions of doping atoms in subsurface layers of crystals as well as in thin films by means of the registration of energy spectra of ions scattered to angles higher than π/2
Externí odkaz:
https://doaj.org/article/3e62edc0fa1746b9b74e7022553d62fe
Publikováno v:
Litʹë i Metallurgiâ, Vol 0, Iss 4, Pp 144-150 (2014)
The method of complex surface hardening of steel detailswas designed. The method is a compound of two processes of hardening: chemical heat treatment and physical vapor deposition (PVD) of the coating. The result, achieved in this study is much highe
Externí odkaz:
https://doaj.org/article/089cfd14c3ee4120889760cb182b4771
Publikováno v:
Вестник. Серия физическая, Vol 28, Iss 1, Pp 89-93 (2009)
The work is devoted to modeling on the computer of radiation defects generation processes in the titan irradiated by light ions, within the limits of an in cascade-probabilistic method. Algorithms and complex of programs for calculation of spectra of
Externí odkaz:
https://doaj.org/article/e6e35ba0991346a598c20904eced2ae9
Publikováno v:
Doklady of the National Academy of Sciences of Belarus. 67:101-110
TiAlCuN coatings were deposited by reactive magnetron sputtering on substrates of single-crystal silicon, and Titanium Grade2 wafers. To control and manage the coating deposition process by reactive magnetron sputtering, a previously developed modula