Zobrazeno 1 - 5
of 5
pro vyhledávání: '"F. E. Freitas"'
Publikováno v:
Journal of Advanced Dielectrics, Vol 11, Iss 3, Pp 2140007-1-2140007-6 (2021)
BiFeO3 thin films were prepared using the chemical solution route on Pt/TiO2/SiO2/Si(100) substrates under different crystallization kinetics. The crystallization kinetic effects on the dielectric and electrical properties have been investigated. The
Externí odkaz:
https://doaj.org/article/fd58debcc41d41e1a2d8cf09d6d85817
Publikováno v:
Scopus
Repositório Institucional da UNESP
Universidade Estadual Paulista (UNESP)
instacron:UNESP
Journal of Advanced Dielectrics, Vol 11, Iss 3, Pp 2140007-1-2140007-6 (2021)
Repositório Institucional da UNESP
Universidade Estadual Paulista (UNESP)
instacron:UNESP
Journal of Advanced Dielectrics, Vol 11, Iss 3, Pp 2140007-1-2140007-6 (2021)
Made available in DSpace on 2022-04-28T19:40:51Z (GMT). No. of bitstreams: 0 Previous issue date: 2021-06-01 BiFeO3 thin films were prepared using the chemical solution route on Pt/TiO2/SiO2/Si(100) substrates under different crystallization kinetics
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ed6edaf8899a641e9bbbe95e538ee126
Publikováno v:
Web of Science
Repositório Institucional da UNESP
Universidade Estadual Paulista (UNESP)
instacron:UNESP
Repositório Institucional da UNESP
Universidade Estadual Paulista (UNESP)
instacron:UNESP
Made available in DSpace on 2020-12-10T20:00:45Z (GMT). No. of bitstreams: 0 Previous issue date: 2020-05-18 Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) Coor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::11ebb8c923d19f3b9437fc222e1fb65a
Publikováno v:
Journal of Physics D: Applied Physics. 44:185405
This work reports on the study of surface properties of CaF2 films (30 and 10 nm thick) grown on (1 1 1) Si by molecular beam epitaxy at substrate temperatures from 400 to 700 °C. Reflection high-energy electron diffraction (RHEED) analysis indicate
Publikováno v:
Journal of Physics D: Applied Physics; May2011, Vol. 44 Issue 18, p185405-185405, 1p