Zobrazeno 1 - 10
of 15
pro vyhledávání: '"F. D. Wall"'
Publikováno v:
Microsystem Technologies. 11:319-330
The corrosion behavior of electrodeposited structural Ni (LIGA Ni) was assessed under aqueous and atmospheric conditions. Corrosion rates were measured and damage morphology was documented for comparison with wrought materials such as commercially av
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16d7ed9a9aed7f6d16b7419f5b1a794d
https://doi.org/10.1007/s00542-004-0447-7
https://doi.org/10.1007/s00542-004-0447-7
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 206:1062-1065
A mechanistic-based understanding of corrosion is needed in order to predict aging characteristics and reliability of either electronic or structural components. Although it is well known that the presence of a halide such as Cl− is necessary for p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a76f0817002c60ba5dc8d25e01d1294
https://doi.org/10.1016/s0168-583x(03)00911-x
https://doi.org/10.1016/s0168-583x(03)00911-x
Autor:
Donald R. Baer, F. D. Wall, B. C. Bunker, G. C. Nelson, John P. Sullivan, Charles F. Windisch, Kevin R. Zavadil, J. C. Barbour, M. H. Engelhardt
Publikováno v:
The Journal of Physical Chemistry B. 106:4705-4713
Secondary ion mass spectrometry (SIMS) has been used in conjunction with isotopic labeling to determine the extent and rate of passive film hydration on aluminum. The rates at which oxygen- and hydrogen-containing species migrate through the film hav
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::651a5261423898d6e01348772602bc9e
https://doi.org/10.1021/jp013246e
https://doi.org/10.1021/jp013246e
Publikováno v:
Journal of The Electrochemical Society. 143:449-458
The use of advanced graphite fiber polymeric matrix composites in multimaterial assemblies which must maintain mechanical integrity in aqueous environments has initiated interest in the galvanic degradation of these materials. Of recent concern is th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f14c2c12af4b5483e22fde05f577d4a6
https://doi.org/10.1149/1.1836464
https://doi.org/10.1149/1.1836464
Publikováno v:
MRS Proceedings. 781
High purity Al samples were implanted with 35 keV Cl+ then polarized in Cl--free electrolyte in order to ascertain corrosion behavior as a function of Cl content. Electrochemical data indicated implant fluences between 5x1015 and 2x1016 Cl+cm-2 resul
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::91721502fab98fd13303d58fe26c1320
https://doi.org/10.1557/proc-781-z2.9
https://doi.org/10.1557/proc-781-z2.9
Publikováno v:
Microscopy and Microanalysis. 8:1616-1617
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cee70256017472277ae482b00e4c4e1b
https://doi.org/10.1017/s1431927602104661
https://doi.org/10.1017/s1431927602104661
Publikováno v:
Microscopy and Microanalysis. 7:1278-1279
This research program is intended to develop new insight into the mechanisms of localized corrosion initiation in passive metals through unique approaches based on examining corrosion initiation on needle-shaped samples similar to field emitter tips.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93081c7b280b7b27613b62921030c9a3
https://doi.org/10.1017/s1431927600032463
https://doi.org/10.1017/s1431927600032463
Publikováno v:
Journal of The Electrochemical Society. 153:B289
The pitting potential of pure aluminum thin films in 50 mM K 2 SO 4 was measured as a function of implanted Cl fluence. Samples were implanted with 35 keV Cl + at room temperature using fluences from 2.25 X 10 16 to 3.25 X 10 16 ions cm -2 in increme
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1502d22e7f307dc84b8d7d10ea055358
https://doi.org/10.1149/1.2205172
https://doi.org/10.1149/1.2205172
Publikováno v:
Journal of The Electrochemical Society. 152:B244
Insight into the influence of Cl on the pitting behavior of aluminum has been gained using a combination of ion implantation and oxide deposition. High-purity Al thin-film samples were implanted with 35 keV Cl + followed by plasma deposition of an al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a580fd24e36a8997efe02792a501a4c3
https://doi.org/10.1149/1.1924308
https://doi.org/10.1149/1.1924308