Notching effect on metal etch: A very simple predictive model

Autor: A. La Magna, F. Beffumo, G. Garozzo

Publikováno v: IEEE transactions on semiconductor manufacturing 18 (2005): 355–358.
info:cnr-pdr/source/autori:Garozzo G., Beffumo F., La Magna A./titolo:Notching effect on metal etch: A very simple predictive model/doi:/rivista:IEEE transactions on semiconductor manufacturing/anno:2005/pagina_da:355/pagina_a:358/intervallo_pagine:355–358/volume:18

In this paper, a very simple model of notching effect is reported. From an engineering point of view, the notching effect is an undercut between bottom of metal strip and stop layer (generally oxide) which can be observed in a Cl/sub 2/-BCl/sub 3/ me

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ec25e73a5d9b65acaca2f255e2db6944
https://publications.cnr.it/doc/35532