Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Evgueni Levine"'
Publikováno v:
Photomask Technology 2020.
Generating curvilinear mask shapes in OPC instead of pure rectangular shapes is becoming more and more realistic as a method for improving wafer lithography performance. The main benefit of using curvilinear shapes is an improved process window, mean
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dcfa3afd06ad722f70ea18016c28a785
https://doi.org/10.1117/12.2575474
https://doi.org/10.1117/12.2575474
Publikováno v:
SPIE Proceedings.
LELE double patterning technology is being deployed for 20 nm production. With the use of two separate litho-etch steps in the lithography of one layer, LELE doubles the pitch achievable in the tradional single litho-etch step. However, as wavelength
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e322b7855c5411eda6757aa254ada46
https://doi.org/10.1117/12.979143
https://doi.org/10.1117/12.979143
Autor:
Pat LaCour, Omar El-Sewefy, Alex Volkov, Evgueni Levine, Qiao Li, Christopher E. Reid, Kellen Arb, Pradiptya Ghosh, David Abercrombie
Publikováno v:
SPIE Proceedings.
Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the challenges they present, and various solutions. c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d13379c476317e8a5fbf74e60a738d1a
https://doi.org/10.1117/12.898895
https://doi.org/10.1117/12.898895
Publikováno v:
Proceedings of SPIE; 12/20/2023, Vol. 12751, p127510W-127510W-9, 1p