Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Evan L. Schwartz"'
Publikováno v:
Complex Macromolecular Architectures: Synthesis, Characterization, and Self-Assembly
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a1e05a79d18af852548c9999356ce6b
https://doi.org/10.1002/9780470825150.ch25
https://doi.org/10.1002/9780470825150.ch25
Autor:
Xavier André, Marvin Y. Paik, Evan L. Schwartz, Joan K. Bosworth, Detlef-M. Smilges, Christopher K. Ober
Publikováno v:
Macromolecules. 43:4253-4260
The real time changes occurring within films of cylinder-forming poly(α-methylstyrene-block-4-hydroxystyrene) (PαMS-b-PHOST) were monitored as they were swollen in tetrahydrofuran (THF) and acetone solvent vapors. In situ information was obtained b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::40678f4ef18dc4b2d0182481ac2ed877
https://doi.org/10.1021/ma902646t
https://doi.org/10.1021/ma902646t
Autor:
Charles T. Black, Joan K. Bosworth, Ricardo Ruiz, Christopher K. Ober, Evan L. Schwartz, Xavier André
Publikováno v:
Journal of Photopolymer Science and Technology. 20:519-522
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb9084f3ab42be38040b4af35587aec8
https://doi.org/10.2494/photopolymer.20.519
https://doi.org/10.2494/photopolymer.20.519
Autor:
Emmanuel P. Giannelis, Marie Krysak, Peng Xie, Christopher K. Ober, Markos Trikeriotis, Paul Zimmerman, Bruce W. Smith, Neal Lafferty, Warren Montgomery, Evan L. Schwartz
Publikováno v:
SPIE Proceedings.
We have developed a transparent, high refractive index inorganic photoresist with significantly higher etch resistance than even the most robust polymeric resist. As feature sizes continue to decrease, film thickness must be reduced in order to preve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a9ff64597424a77b7532edcb5cf9b61
https://doi.org/10.1117/12.879385
https://doi.org/10.1117/12.879385
Autor:
Jin-Kyun Lee, Vikram Daga, James J. Watkins, Christopher K. Ober, Evan L. Schwartz, Ying Lin, Curran Chandler
Publikováno v:
Nano letters. 11(3)
Photoinduced ordering of disordered block copolymers (BCPs) would provide an on-demand, nonintrusive route for formation of well-ordered nanostructures in arbitrarily defined regions of an otherwise disordered material. Here we achieve this objective
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b1edff200598b8e6f648a670e5722147
https://pubmed.ncbi.nlm.nih.gov/21280663
https://pubmed.ncbi.nlm.nih.gov/21280663
Cross-linkable molecular glasses: low dielectric constant materials patternable in hydrofluoroethers
Autor:
Eisuke Murotani, Priscilla G. Taylor, Alex Zakhidov, Jin-Kyun Lee, Evan L. Schwartz, George G. Malliaras, Margarita Chatzichristidi, Christopher K. Ober
Publikováno v:
ACS applied materialsinterfaces. 1(10)
We report a new approach to solution-processable low-dielectric-constant (low-k) materials including photolithographic patterning of these materials in chemically benign and environmentally friendly solvents. A series of semiperfluorinated molecular
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ff92973ff1930af56622666ca3001892
https://pubmed.ncbi.nlm.nih.gov/20355874
https://pubmed.ncbi.nlm.nih.gov/20355874
Autor:
Markos Trikeriotis, Christopher K. Ober, Emmanuel P. Giannelis, Marie Krysak, Evan L. Schwartz, Paul A. Zimmerman, Neal Lafferty, Woo Jin Bae, Peng Xie, Bruce W. Smith
Publikováno v:
SPIE Proceedings.
The trend of ever decreasing feature sizes in subsequent lithography generations is paralleled by the need to reduce resist thickness to prevent pattern collapse. Thinner films limit the ability to transfer the pattern to the substrate during etch st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f2c4f6ec001f2fa6837516eb5a09ea5d
https://doi.org/10.1117/12.846672
https://doi.org/10.1117/12.846672
Publikováno v:
SPIE Proceedings.
Future demands of the semiconductor industry call for robust patterning strategies for critical dimensions below twenty nanometers. The self assembly of block copolymers stands out as a promising, potentially lower cost alternative to other technolog
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fa080e71d0f049b0af771cbc14217524
https://doi.org/10.1117/12.848409
https://doi.org/10.1117/12.848409
Autor:
Christopher K. Ober, Evan L. Schwartz
Publikováno v:
Advanced Nanomaterials
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::82485c6940a88f82c27a94f4d7797ff4
https://doi.org/10.1002/9783527628940.ch1
https://doi.org/10.1002/9783527628940.ch1
Autor:
Albert W. Ko, Christopher K. Ober, Marvin Y. Paik, Charles T. Black, Ricardo Ruiz, Evan L. Schwartz, Detlef-M. Smilgies, Jenny Q. Huang, Joan K. Bosworth
Publikováno v:
ACS nano. 2(7)
Poly(alpha-methylstyrene)-block-poly(4-hydroxystyrene) acts as both a lithographic deep UV photoresist and a self-assembling material, making it ideal for patterning simultaneously by both top-down and bottom-up fabrication methods. Solvent vapor ann
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::269d357d3169f6577ec0c759bddb33f3
https://pubmed.ncbi.nlm.nih.gov/19206307
https://pubmed.ncbi.nlm.nih.gov/19206307