Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Eungryong Oh"'
Autor:
Hyun Kim, Sang Ho Lee, Gwang-Gon Kim, Jung-Hwan Kim, Lukasz Jerzy Macht, Hong-Bok Yeon, Rob van der Meulen, Edo Maria Hulsebos, Joonseuk Lee, Jin Dai, Chanha Park, Young-Deuk Kim, Jigang Ma, Miao Yu, Paul Böcker, Sotirios Tsiachris, Seung-Uk Jeong, Frans G. C. Bijnen, Eungryong Oh
Publikováno v:
Optical Microlithography XXXIV.
In world-leading semiconductor manufacturing, the device feature size keeps on reducing and with it processes become more challenging in the next technology node. The On Product Overlay (OPO) budget is therefore required to reduce further. Alignment
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::631f5d827f706a35e8f45fec2dec382a
https://doi.org/10.1117/12.2584618
https://doi.org/10.1117/12.2584618
Autor:
Roie Volkovich, Eran Amit, Jungtae Lee, Einat Peled, Sangjun Han, Sanghuck Jeon, Minhyung Hong, Jieun Lee, Seungyoung Kim, Seongjae Lee, Tal Yaziv, Honggoo Lee, Dana Klein, Dongsub Choi, Anat Marchelli, Alexander Svizher, Dongyoung Lee, Dohwa Lee, Yuval Lamhot, Aaron Cheng, Ahlin Choi, Eungryong Oh, Jeongpyo Lee, John C. Robinson, Zephyr Liu
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
In overlay (OVL) metrology the quality of measurements and the resulting reported values depend heavily on the measurement setup used. For example, in scatterometry OVL (SCOL) metrology a specific target may be measured with multiple illumination set
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2790de4e8c4d0bdd133a3ff51e49279a
https://doi.org/10.1117/12.2300507
https://doi.org/10.1117/12.2300507
Autor:
Sangjun Han, Seungyoung Kim, Rovira Pablo, Markus Mengel, Nakyoon Kim, Getin Raphael Jean Michel Marie, Dongsub Choi, Sanghuck Jeon, Minhyung Hong, Honggoo Lee, Jieun Lee, Ahlin Choi, Sungchul Yoo, Dongyoung Lee, Eungryong Oh, John C. Robinson
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
Lithography process control solutions require more exacting capabilities as the semiconductor industry goes forward to the 1x nm node DRAM device manufacturing. In order to continue scaling down the device feature sizes, critical dimension (CD) unifo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9956046e15695445bb7657cca6b6efce
https://doi.org/10.1117/12.2299976
https://doi.org/10.1117/12.2299976
Autor:
Seungyoung Kim, Sangjun Han, Hyowon Park, Minhyung Hong, Sanghuck Jeon, Stilian Ivanov Pandev, Waley Liang, Ahlin Choi, Jieun Lee, Dongyoung Lee, Jeongpyo Lee, Eungryong Oh, Nakyoon Kim, John C. Robinson, Honggoo Lee, Dongsub Choi
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
Overlay is one of the most critical process control steps of semiconductor manufacturing technology. A typical advanced scheme includes an overlay feedback loop based on after litho optical imaging overlay metrology on scribeline targets. The after l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::636aeb5a1687df3dca41b199e91a19f5
https://doi.org/10.1117/12.2300946
https://doi.org/10.1117/12.2300946
Autor:
Minhyung Hong, Jieun Lee, Guy Ben-Dov, Young-Sik Kim, Eitan Hajaj, Seungyoung Kim, Yoonshik Kang, Dana Klein, Anna Golotsvan, Dongyoung Lee, Ahlin Choi, Saltoun Lilach, Eungryong Oh, Tal Marciano, Dan Serero, Kyuchan Shim, Sangjoon Han, Aharon Sharon, Honggoo Lee
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
As semiconductor manufacturing technology progresses and the dimensions of integrated circuit elements shrink, overlay budget is accordingly being reduced. Overlay budget closely approaches the scale of measurement inaccuracies due to both optical im
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d30078f3576a31d2bab23b91e8b33587
https://doi.org/10.1117/12.2300153
https://doi.org/10.1117/12.2300153
Autor:
Honggoo Lee, Sangjun Han, Minhyung Hong, Seungyong Kim, Jieun Lee, DongYoung Lee, Eungryong Oh, Ahlin Choi, Park, Hyowon, Waley Liang, DongSub Choi, Nakyoon Kim, Jeongpyo Lee, Pandev, Stilian, Sanghuck Jeon, Robinson, John C.
Publikováno v:
Proceedings of SPIE; 2018, Vol. 10585, p1-9, 9p
Autor:
Honggoo Lee, Sangjun Han, Minhyung Hong, Seungyong Kim, Jieun Lee, DongYoung Lee, Eungryong Oh, Ahlin Choi, Nakyoon Kim, Robinson, John C., Mengel, Markus, Rovira, Pablo, Sungchul Yoo, Getin, Raphael, Dongsub Choi, Sanghuck Jeon
Publikováno v:
Proceedings of SPIE; 2018, Vol. 10585, p1-9, 9p