Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Eugene Miloslavsky"'
Autor:
Alain Domissy, Andrew Jesaitis, bamiwoaluko, Benjamin Carr, Michele Mastropietro, Emannuel Fernandes de Oliveira Carvalho, Eugene Miloslavsky, Robin Long, Ngumih Fien, Mary Gathoni, Henry Liu, Marijke J. van Baren, jessMaia, Bruno P. Kinoshita, Kaushik Ghose, Konstantin Taletskiy, Kushal Beniwal, Mark A. Jensen, Levai Mackenzie Ágbàrà, Manabu Ishii, medcelerate, Michael R. Crusoe, Ruth B. McCole, sersorrel, Adrian Sharma, Steffen Möller, Oghenemaro Akpobi, Stian Soiland-Reyes, Luka Stojanovic, Sarah Wait Zaranek, Peter Amstutz, Toby Hodges, Tomoya Tanjo, Daiki Tsuchiya, Wolfgang Gerlach, Zipho Mashologu
Common Workflow Language User Guide
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::680552fbb787d2ca291a50b85fd60749
Publikováno v:
SPIE Proceedings.
Optical Proximity Correction (OPC) can be formulated as a constrained optimization problem. The constraints are mask constraint rules for space and width. These are sometimes called Mask Rule Checks (MRC), or Design Rule Checks (DRC). At 90nm and bel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b57821565a067b3fe515cdcee5c86145
https://doi.org/10.1117/12.568420
https://doi.org/10.1117/12.568420
Publikováno v:
SPIE Proceedings.
Mask manufacturing for the 100 and 65nm nodes is accompanied by an increasing deployment of VSB mask writing machines. The continuous integration trend in design and broad deployment of RET have a tremendous impact on file size and pattern complexity
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b050ee5b1dcf27ad95e4959d60b9a466
https://doi.org/10.1117/12.504274
https://doi.org/10.1117/12.504274
Conference
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.