Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Erwin Deng"'
Autor:
I. Y. Chang, Xiang Fang, Elven Huang, Hung-Yueh Liao, Chuan-Chun Lee, Ling-Chieh Lin, Chien-Nan Lin, Min-Ying Lu, Hsu-Tang Liu, Chuen-Huei Yang, Erwin Deng, Shou-Yuan Ma, Ming-Feng Shen, Jonathan Muirhead
Publikováno v:
Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology.
In this paper we combined the hotspot pattern library and the rule-based scoring system into a modularized hotspot-checking rule deck running on an automatic flow. Several DFM (design for manufacture) properties criteria will be defined to build a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17646e8c46eac26f18cb1ee885870286
https://doi.org/10.1117/12.2323956
https://doi.org/10.1117/12.2323956
Autor:
Gordon Russell, Min-Ying Lu, Rachel Lee, Jenny Tsai, Erwin Deng, Amanda Bowhill, Ling-Chieh Lin, Hien T. Vu, Hung-Yueh Liao, Jian-Cheng Chen, Chuen-Huei Yang, Joe Tsai, Shou-Yuan Ma, Ming-Feng Shen, Xiang Fang
Publikováno v:
SPIE Proceedings.
The Mask Data Correctness Check (MDCC) is a reticle-level, multi-layer DRC-like check evolved from mask rule check (MRC). The MDCC uses extended job deck (EJB) to achieve mask composition and to perform a detailed check for positioning and integrity
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4dc1bf2ecbb94ad0e5e389ae2d7994d
https://doi.org/10.1117/12.2278691
https://doi.org/10.1117/12.2278691
Autor:
Jenny Tsai, Erwin Deng, Roger Lin, Shou-Yuan Ma, Amanda Bowhill, Chuen-Huei Yang, Gordon Russell, Alice Wang, Ling-Chieh Lin, Hung-Yueh Liao, Hien T. Vu, Joe Tsai, Rachel Lee
Publikováno v:
SPIE Proceedings.
The mask composition checking flow is an evolution of the traditional mask rule check (MRC). In order to differentiate the flow from MRC, we call it Mask Data Correctness Check (MDCC). The mask house does MRC only to identify process limitations incl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b57a3dbcb854916ccc0d9c664c3030d9
https://doi.org/10.1117/12.2240292
https://doi.org/10.1117/12.2240292
Publikováno v:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII.
Photolithography process is getting more and more sophisticated for wafer production following Moore’s law. Therefore, for wafer fab, consolidated and close cooperation with mask house is a key to achieve silicon wafer success. However, generally s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::62f36a889826f5adc636e2afcca6419d
https://doi.org/10.1117/12.2192951
https://doi.org/10.1117/12.2192951
Autor:
Xiang Fang, Shou-Yuan Ma, Chien-Nan Lin, Hsu-Tang Liu, Chuan-Chun Lee, Chuen-Huei Yang, I-Y Chang, Erwin Deng, Ming-Feng Shen, Min-Ying Lu, Ling-Chieh Lin, Hung-Yueh Liao, Huang, Elven, Muirhead, Jonathan
Publikováno v:
Proceedings of SPIE; 8/23/2018, Vol. 10807, p1-5, 5p
Publikováno v:
SPIE Proceedings.
For many maskshops, designed parallel mask data preparation (MDP) flows accompanying with a final data comparison are viewed as a reliable method that could reduce quality risks caused by mis-operation. However, in recent years, more and more mask da
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cf8ee673c75765f73b86872fff000f95
https://doi.org/10.1117/12.2028297
https://doi.org/10.1117/12.2028297
Publikováno v:
SPIE Proceedings.
For those wafer fabs that have no their own maskshops, the main target of mask quality department is to gain stable mask quality performance through effective supplier management, and therefore achieves competitive business results. After dealing wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3458ecd84353e7c24b8bed8fa46d4da1
https://doi.org/10.1117/12.2028296
https://doi.org/10.1117/12.2028296
Publikováno v:
SPIE Proceedings.
In semiconductor industry, many wafer fabs acquire masks from qualified suppliers because they do not have in-house maskshops. Under the circumstances, for these fabs, their main objectives of mask supplier management are to carry out gaining stable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4c12e5d3845eb1aa42a3a80641ead1f9
https://doi.org/10.1117/12.964097
https://doi.org/10.1117/12.964097