Zobrazeno 1 - 10
of 22
pro vyhledávání: '"Erin C. H. Kyle"'
Autor:
Jingtian Fang, Pan Wang, Jin Chen, Daniel M. Fleetwood, Rong Jiang, Erin C. H. Kyle, Xiao Shen, Stephen W. Kaun, Ronald D. Schrimpf, James S. Speck, Sokrates T. Pantelides, En Xia Zhang
Publikováno v:
IEEE Transactions on Device and Materials Reliability. 18:364-376
Gate and drain bias dependences of hot carrier degradation are evaluated for AlGaN/GaN HEMTs fabricated via two different process methods. Both positive and negative threshold voltage $V_{\mathbf{th}}$ shifts are observed for each device type, depend
Autor:
Pan Wang, Xiao Shen, Rong Jiang, Daniel M. Fleetwood, En Xia Zhang, Jin Chen, Sokrates T. Pantelides, James S. Speck, Erin C. H. Kyle, Michael W. McCurdy, Ronald D. Schrimpf, Stephen W. Kaun
Publikováno v:
IEEE Transactions on Nuclear Science. 64:218-225
Responses to 1.8 MeV proton irradiation and 10-keV X-ray irradiation under typical bias conditions are investigated for AlGaN/GaN HEMTs fabricated with different types of process technologies. We find that, in contrast to previous generations of proc
Publikováno v:
Journal of Crystal Growth. 454:164-172
InAlN grown by plasma-assisted molecular beam epitaxy often contains a honeycomb microstructure. The honeycomb microstructure consists of 5–10 nm diameter aluminum-rich regions which are surrounded by indium-rich regions. Layers without this micros
Autor:
Aaron R. Arehart, Ronald D. Schrimpf, Steven A. Ringel, Daniel M. Fleetwood, Erin C. H. Kyle, Paul Saunier, Yevgeniy Puzyrev, Stephen W. Kaun, Sokrates T. Pantelides, Jin Chen, En Xia Zhang, James S. Speck, C. Lee
Publikováno v:
IEEE Transactions on Device and Materials Reliability. 16:282-289
A small degradation of threshold voltage and a significant reduction in dc and RF transconductance are observed for AlGaN/GaN high-electron-mobility transistors fabricated via three different process techniques and subjected to high voltage stress in
Autor:
James S. Speck, Michael W. McCurdy, Erin C. H. Kyle, Ronald D. Schrimpf, Cher Xuan Zhang, Daniel M. Fleetwood, Stephen W. Kaun, Jin Chen, En Xia Zhang
Publikováno v:
IEEE Transactions on Nuclear Science. 61:2959-2964
AlGaN/GaN high electron mobility transistors (HEMTs) irradiated with 1.8-MeV protons show more relative degradation in RF power/current gain, cutoff frequency f T , and maximum oscillation frequency f max than DC transconductance. These result from r
Publikováno v:
Journal of Applied Physics. 126:035703
The InAlN alloy system has bandgap energies that span the entire visible range and is a promising candidate for bandgap engineering. To facilitate bandgap engineering, the bandgap bowing for the entire composition range must be well characterized. In
Autor:
Sokrates T. Pantelides, James S. Speck, En Xia Zhang, Yevgeniy Puzyrev, Stephen W. Kaun, Erin C. H. Kyle, Cher Xuan Zhang, Michael W. McCurdy, Ronald D. Schrimpf, Daniel M. Fleetwood, Jin Chen
Publikováno v:
IEEE Transactions on Nuclear Science. 60:4080-4086
The responses to 1.8 MeV proton irradiation of AlGaN/GaN HEMTs grown under Ga-rich and ammonia-rich conditions are investigated in this work. Changes in defect energy distributions of AlGaN/GaN HEMTs during proton irradiation are characterized via te
Autor:
Stephen W. Kaun, Sokrates T. Pantelides, Kai Ni, Ronald D. Schrimpf, James S. Speck, Erin C. H. Kyle, Rong Jiang, Xiao Shen, Pan Wang, Jin Chen, Daniel M. Fleetwood, En Xia Zhang
Publikováno v:
2016 16th European Conference on Radiation and Its Effects on Components and Systems (RADECS).
Significant shifts in threshold voltage have been observed during 10-keV X-ray irradiation of passivated and unpassivated AlGaN/GaN HEMTs. Oxygen and hydrogen impurities are found to contribute to differences in threshold voltage shifts and transcond
Publikováno v:
Journal of Crystal Growth. :80
Autor:
James S. Speck, Sokrates T. Pantelides, Jin Chen, Guo Xing Duan, Stephen W. Kaun, En Xia Zhang, Xiao Shen, Rong Jiang, Ronald D. Schrimpf, Erin C. H. Kyle, Daniel M. Fleetwood
Publikováno v:
Applied Physics Letters. 109:023511
Hot-carrier degradation and room-temperature annealing effects are investigated in unpassivated ammonia-rich AlGaN/GaN high electron mobility transistors. Devices exhibit a fast recovery when annealed after hot carrier stress with all pins grounded.