Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Erik Ruinemans"'
Autor:
Daan Zaalberg, Mirka Maresca, Erik Ruinemans, Niels Tromp, Dennis Dolkens, Tibor Agocs, Jeff lynn, Ivan Lloro, Menno Schuil, Menno de Haan, Rik ter Horst, Eddy Elswijk
Publikováno v:
Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation V.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b0b2cc9d3afb0099d46351235da3a0b
https://doi.org/10.1117/12.2629995
https://doi.org/10.1117/12.2629995
Autor:
Jean Fontignié, Erik Ruinemans, I. Lloro, Mickaël Lacroix, Stéphane Jury, Achrène Dyrek, Jean-Christophe Guillard, Olivier Corpace, Niels Tromp, Yann Reinert, O. Cloue, Ayoub Bounab, Jorge Mendes, Gert Raskin, Jeffrey Lynn, Jean-Christophe Barrière
Publikováno v:
Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation IV.
The Mid-infrared Imager and Spectrograph (METIS) is one of the first light instruments of the European Extremely Large Telescope (ELT). METIS optical design contains a first stage called common fore optics, which operates at cryogenic temperatures. B
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::89cca5faf09134e2eb158167f38e2714
https://doi.org/10.1117/12.2560259
https://doi.org/10.1117/12.2560259
Autor:
Luigi Scaccabarozzi, Wim van der Zande, Maurice Bogers, Laurens de Winter, Erik Ruinemans, Rob van Gils, Derk Brouns, Hans Vermeulen, Florian Didier Albin Dhalluin, Daniel Smith, Juan Diego Arias Espinoza, Maria Peter, Sven Lentzen, Jack Van der Sanden
Publikováno v:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII.
EUV pellicle membranes are being pursued to protect scanner images from repeating defects caused by reticle fall-on particle defects. Because most materials highly absorb EUV, pellicle membranes must be ultrathin. In an attempt to increase the streng
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::050ffb75c25838090c8bccbe68c00d72
https://doi.org/10.1117/12.2197454
https://doi.org/10.1117/12.2197454