Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Erik C. Hagberg"'
Autor:
Erik C. Hagberg
A short, simple, versatile methodology was developed for the synthesis of poly(2,5benzophenone containing coil-rod-coil triblock copolymers. After a model study, poly(2,5benzophenone macroinitiators were synthesized via endcapping the Ni(0)-catalyzed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::71eaf37f097b33a2917338fa11204bec
https://doi.org/10.31274/rtd-180813-14256
https://doi.org/10.31274/rtd-180813-14256
Autor:
Timothy A. von Werne, Justine A. Shaw, Janet A. Maegerlein, J. Campbell Scott, Erik C. Hagberg, Kenneth R. Carter
Publikováno v:
Small. 3:1703-1706
Plating up: A new fabrication technique for the creation of patterns of metal or circuitization on a substrate is demonstrated. Nanocontact molding allows for the reproduction of features ranging from millimeter to subnanometer features into a functi
Publikováno v:
Angewandte Chemie. 116:5920-5923
Publikováno v:
Angewandte Chemie International Edition. 43:5796-5799
Publikováno v:
Macromolecules. 37:4748-4754
The effects of solvent and monomer structure on the Ni(0)-catalyzed polymerization of 2,5-dichloro-3-(2‘-thiophenecarbonyl)thiophene, 3-benzenesulfonyl-2,5-dichlorothiophene, 2,5-dichlorobenzophenone, and 2-benzenesulfonyl-1,4-dichlorobenzene were
Publikováno v:
Macromolecules. 37:3642-3650
A short, simple, versatile methodology was developed for the synthesis of poly(2,5-benzophenone) containing coil−rod−coil triblock copolymers. After a model study, poly(2,5-benzophenone) macroinitiators were synthesized via end-capping poly(2,5-d
Autor:
Craig J. Hawker, Erik C. Hagberg, David S. Germack, Kenneth R. Carter, Valerie V. Sheares, Timothy A. von Werne
Publikováno v:
Journal of the American Chemical Society. 125:3831-3838
A novel approach is presented for manipulating the size and chemistry of nanoscopic features using a combination of contact molding and living free radical polymerization. In this approach a highly cross-linked photopolymer, based on a methacrylate/a
Publikováno v:
Journal of Inorganic and Organometallic Polymers and Materials. 17
We present the evaluation of a cyclophosphazene-containing polymer as a patternable resist for imprint lithography. Hexamethacryloxybutoxycyclotriphosphazene layers containing small amounts of photoinitiator can be applied to silicon wafers substrate
Publikováno v:
Nano letters. 7(2)
Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the ori
Autor:
Robert M. Waymouth, Russell C. Pratt, Andrew P. Dove, Erik C. Hagberg, Bas G. G. Lohmeijer, Hongbo Li, James L. Hedrick
Publikováno v:
N-Heterocyclic Carbenes in Synthesis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b98e064896e0b996e39dacd1f86ebc04
https://doi.org/10.1002/9783527609451.ch12
https://doi.org/10.1002/9783527609451.ch12