Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Eric S. Moyer"'
Publikováno v:
Chemistry of Materials. 14:1845-1852
The structures of hydrogen silsesquioxane based porous low dielectric constant (low-k) films (XLK) prepared with varying process conditions are characterized using a combination of high-energy ion scattering, X-ray reflectivity, and small-angle neutr
Publikováno v:
Chemistry of Materials. 12:2770-2780
The design, synthesis, and properties of two new types of poly(borosiloxane) preceramic polymers, diethylborazine- (PVS−DEB) and pinacolborane-modified (PVS−PIN) poly(vinylsiloxane)s, are reported. The polymers are synthesized in excellent yields
Autor:
Ather Ashraf, Eric S. Moyer, J. K. Lee, Edward Somerville, Sheng Wang, BK Hwang, Gerard Nowaczyk, Wei Chen
Publikováno v:
MRS Proceedings. 863
This communication describes the results of a potential spin-on glass (SOG) solution for narrow and high aspect ratio trench fill in both shallow trench isolation (STI) and premetal dielectric (PMD) applications. We have focused our development work
Autor:
Bianxiao Zhong, Eric S. Moyer
Publikováno v:
ACS Symposium Series ISBN: 9780841238572
Polymers for Microelectronics and Nanoelectronics
Polymers for Microelectronics and Nanoelectronics
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::509c3cab6f9b17d260aedd7dc6dcc991
https://doi.org/10.1021/bk-2004-0874.ch013
https://doi.org/10.1021/bk-2004-0874.ch013
Autor:
M. J. Radler, Pamela S. Foster, Robert F. Harris, Eric S. Moyer, J. N. Bremmer, Edward W. Rutter, M. T. Bernius, D. Castillo, A. J. G. Strandjord, R.H. Heistand, G. S. Becker
Publikováno v:
MRS Proceedings. 323
Negative working photodefinable benzocyclobutene formulations capable of obtaining patterned dielectric films from 1 to 20 microns thick are being developed using bisaryl azides as photocrosslinkers. Three different formulations are used to cover thi
Autor:
Chen, Wei, Wang, Sheng, Ashraf, Ather, Somerville, Edward, Nowaczyk, Gerard, Hwang, BK, Lee, JK, Moyer, Eric S.
Publikováno v:
MRS Online Proceedings Library; 2005, Vol. 863 Issue 1, p1-6, 6p
Autor:
Strandjord, A.J.G., Rogers, W.B., Ida, Y., DeVeillis, R.R., Shiau, S., Moyer, E.S., Scheck, D.M., Garron, P.E.
Publikováno v:
1997 Proceedings 47th Electronic Components & Technology Conference; 1997, p1260-1268, 9p
Autor:
Strandjord, A.J.G., Rogers, W.B., Ida, Y., Shiau, S., Moyer, E.S., Scheck, D.M., DeVellis, R.R., Garrou, P.E.
Publikováno v:
IEMT/IMC Symposium, 1st Joint International Electronic Manufacturing Symposium & the International Microelectronics Conference; 1997, p261-266, 6p
Autor:
Qinghuang Lin, Raymond A. Pearson, Jeffrey C. Hedrick, Zhenan Bao, Kyungkon Kim, Guolun Zhong, Jung-Il Jin, Jung Ho Park, Seoung Hyun Lee, Dong Woo Kim, Yung Woo Park, Whikun Yi, M. E. van der Boom, T. J. Marks, Sung-Yeon Jang, Manuel Marquez, Gregory A. Sotzing, T. H. Fedynyshyn, W. A. Mowers, R. R. Kunz, R. F. Sinta, M. Sworin, A. Cabral, J. Curtin, Toshiro Itani, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Naomi Shida, Minoru Toriumi, Ronald L. Jones, Vivek M. Prabhu, Darío L. Goldfarb, Eric K. Lin, Christopher L. Soles, Joseph L. Lenhart, Wen-li Wu, Marie Angelopoulos, Daniel A. Fischer, Sharadha Sambasivan, B. Voit, F. Braun, Ch. Loppacher, S. Trogisch, L. M. Eng, R. Seidel, A. Gorbunoff, W. Pompe, M. Mertig, Martin Brehmer, Lars Conrad, Lutz Funk, Dirk Allard, Patrick Théato, Anke Helfer, R. D. Miller, W. Volksen, V. Y. Lee, E. Connor, T. Magbitang, R. Zafran, L. Sundberg, C. J. Hawker, J. L. Hedrick, E. Huang, M. Toney, Q. R. Huang, C. W. Frank, H. C. Kim, C. Tyberg, J. Hedrick, E. Simonyi, S. Gates, S. Cohen, K. Malone, H. Wickland, M. Sankara