Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Eric Meyette"'
Autor:
Eric Meyette, Merritt Funk, Radha Sundararajan, Blake R Parkinson, Dan Prager, Kenneth A. Bandy, Asao Yamashita
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
As die feature sizes continue to decrease, advanced process control has become essential for controlling profile and CD uniformity across the wafer. Gate CD variation must be suppressed by process optimization of lithography, photoresist trim, and ga
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab94dad2f622e09beff226d3f11b035d
https://doi.org/10.1117/12.816095
https://doi.org/10.1117/12.816095
Autor:
Chienfan Yu, Javier Ayala, Cung Tran, James Gay, Anthony Santiago, Eric Meyette, Elizabeth Hampton, Garrett Oakley, Kenneth Bandy, Timothy McCormack, Rajasekhar Venigalla, Frederick Scholl
Publikováno v:
2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.
During manufacturing transitioning from 90 nm to 65 nm node in IBM's 300 mm fab, FEOL (front end of line) defect pareto shifted as a result of the changes in integration scheme. By combining the optically based in-line inspection and electrical kerf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc8e5a8abe6bdb11a9b1297487a73e49
https://doi.org/10.1109/asmc.2008.4528997
https://doi.org/10.1109/asmc.2008.4528997
Autor:
Merritt Funk, Radha Sundararajan, Asao Yamashita, Kenneth A. Bandy, Dan Prager, Alok Ranjan, Anita Viswanathan, Eric Meyette, Hyung Mok Lee
Publikováno v:
SPIE Proceedings.
Gate patterning is critical to the final yield and performance of logic devices. Because of this, gate linewidth control is viewed by many as the most critical application for integrated metrology on etch systems. For several years, integrated metrol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3fddb0f652b8e86f9f98c70898e66521
https://doi.org/10.1117/12.774962
https://doi.org/10.1117/12.774962