Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Eric Frendberg"'
Autor:
Eric Frendberg, Firoz Ghadiali, Frank E. Abboud, Guojing Zhang, Kishore K. Chakravorty, Marieke Jager, Yoshihiro Tezuka, Safak Sayan, Ted Liang, Srinath Satyanarayana
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XI.
With the persistent drive to enable EUV lithography (EUVL) for the continuation of pattern scaling and the close collaborations between suppliers and customers, tremendous progress has been made in the last five years in EUV mask infrastructure devel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e0158365acc6ce3dc97b30891aadb6c3
https://doi.org/10.1117/12.2554496
https://doi.org/10.1117/12.2554496
Autor:
Karmen Yung, Wai Kwok, Jeff Farnsworth, Richard E. Schenker, Andrew Jamieson, Wen-Hao Cheng, Yi-Ping Liu, Nathan Wilcox, Matt Vernon, Eric Frendberg, Jun Kim, Scott Chegwidden, Yan Borodovsky
Publikováno v:
Optical Microlithography XXI.
Pixelated phase masks rendered from computational lithography techniques demand one generation-ahead mask technology development. In this paper, we reveal the accomplishment of fabricating Cr-less, full field, defect-free pixilated phase masks, inclu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e78d12bbadd7d6def1a16ceb8a7dfbef
https://doi.org/10.1117/12.772955
https://doi.org/10.1117/12.772955
Publikováno v:
SPIE Proceedings.
We have installed the industry's first commercial electron beam mask repair tool in Intel's mask shop. In this paper we describe our on-going efforts of developing e-beam repair processes for binary, phase-shifting and EUVL masks. We present a comple
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::478bc1bde63dcaffca5a8505467bacc0
https://doi.org/10.1117/12.569210
https://doi.org/10.1117/12.569210
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 23:3101
Mask repair plays an important role in yielding advanced masks that support the lithography roadmap. It is also one of the more challenging parts of mask fabrication. Electron beam induced deposition and etching have shown great potential for mask re
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a8a7382cc6ed550a3a7bca7bd6b45b1
https://doi.org/10.1116/1.2062428
https://doi.org/10.1116/1.2062428