Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Eric Brause"'
Publikováno v:
ECS Transactions. 11:109-116
Aqueous and solvent chemicals are widely used in the semiconductor industry and as the technology nodes shrink device makers are working to extend these cleaning fluids to the next technology node. Internal data shows megasonic agitation can enhance
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b30784ac5f679dbb61c012a3afb5a129
https://doi.org/10.1149/1.2779369
https://doi.org/10.1149/1.2779369
Autor:
Hyuk-Jun Lee, Eric Brause, Eui-Kang Lee, Hong-Seong Sohn, Chan-Gun Park, Jin-Goo Park, Uk Sun Hong
Publikováno v:
ECS Transactions. 11:95-100
Introduction: Process issues related to backside (BS) particles have risen in silicon wafer processing. Fig. 1 shows BS particles generated from a vacuum chuck during wafer transfer and a plate in vacuum chamber. International Technology Roadmap for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::23515c1e8fc269ac57171831574805a1
https://doi.org/10.1149/1.2779367
https://doi.org/10.1149/1.2779367
Publikováno v:
Solid State Phenomena. 92:151-156
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4c0ca54700c39b0d067d19d91e08fa63
https://doi.org/10.4028/www.scientific.net/ssp.92.151
https://doi.org/10.4028/www.scientific.net/ssp.92.151
Publikováno v:
Journal of the IEST. 41:24-30
This paper demonstrates the use of conductivity sensors to monitor and control the concentration of RCA cleaning and hydrofluoric acid (HF) etching solutions. Commercially available electrodeless conductivity sensors were used to monitor and control
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cd22ef07db663714e83602a7f3693d6e
https://doi.org/10.17764/jiet.41.3.f573u112344t8pr5
https://doi.org/10.17764/jiet.41.3.f573u112344t8pr5
Publikováno v:
MRS Proceedings. 477
The continuously increasing integration of today's advanced semiconductors requires increasingly tight process control in the IC manufacturing steps. This paper demonstrates the use of conductivity sensors to monitor and control the chemical concentr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a0afe433967dd33272bd9f2627e6750
https://doi.org/10.1557/proc-477-311
https://doi.org/10.1557/proc-477-311
Publikováno v:
MRS Proceedings. 477
This paper demonstrates the use of megasonic energy to enhance particulate removal in dilute SC1 solutions. Ideal, as well as “real world”, particles were deposited on silicon wafers to challenge the SCl/megasonic particle removal system. Differe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2370f4138a89bbfc93a28c2b9c8aae29
https://doi.org/10.1557/proc-477-21
https://doi.org/10.1557/proc-477-21
Publikováno v:
MRS Proceedings. 477
The use of sulfuric acid to strip photoresist from silicon wafers is a widely employed technique in the semiconductor manufacturing community. In most cases, the acid is combined with hydrogen peroxide to oxidize stripped photoresist material, though
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6efb5a834709df51a728432f0e741e90
https://doi.org/10.1557/proc-477-173
https://doi.org/10.1557/proc-477-173
Publikováno v:
ECS Meeting Abstracts. :1022-1022
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::80844a9a151d3b3a1c2ae79393f9f0e8
https://doi.org/10.1149/ma2007-02/18/1022
https://doi.org/10.1149/ma2007-02/18/1022
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Conference
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