Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Eric Bouche"'
Autor:
Sean Lee, Jeffrey Mileham, C. F. Hua, Sungtae Kim, Ming Sheng Wei, Eric Bouche, Damon Tsai, Frida Liang, Albert Huang
Publikováno v:
SPIE Proceedings.
As device shrink, there are many difficulties with process integration and device yield. Lithography process control is expected to be a major challenge due to tighter overlay and focus control requirement. The understanding and control of stresses a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::26818b3474bd970d9eb4c4f660514058
https://doi.org/10.1117/12.2257799
https://doi.org/10.1117/12.2257799
Publikováno v:
SPIE Proceedings.
Within the semiconductor lithographic process, alignment control is one of the most critical considerations. In order to realize high device performance, semiconductor technology is approaching the 10 nm design rule, which requires progressively smal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fe2474d6a856f4f1f956de774f7aa408
https://doi.org/10.1117/12.2220531
https://doi.org/10.1117/12.2220531
Publikováno v:
SPIE Proceedings.
The semiconductor industry makes dramatic device technology changes over short time periods. As the semiconductor industry advances towards to the 10 nm device node, more precise management and control of processing tools has become a significant man
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44cd7ff058f10d9b3505533a3df18e0c
https://doi.org/10.1117/12.2220479
https://doi.org/10.1117/12.2220479
A study of feed-forward strategies for overlay control in lithography processes using CGS technology
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
In advanced lithography, controlling the overlay budget is one of the most critical requirements. For device nodes at 10nm and below, there are many process-based sources of surface displacement that contribute to the lithography overlay budget that
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ddbc147cf0aa84a037b5e3d0b297de8
https://doi.org/10.1109/asmc.2015.7164427
https://doi.org/10.1109/asmc.2015.7164427
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2015, p395-400, 6p
Publikováno v:
Fair Disclosure Wire (Quarterly Earnings Reports). 11/15/2016.
Autor:
Federica D’Ascenzo
Depuis le romantisme, la littérature a annexé les innombrables formes d'impuissance inhérentes à la complexité du monde moderne. Le présent ouvrage réfléchit sur les raisons et les modalités qui ont transformé la déclinaison de l'impuissan
Autor:
Amélie Dubois
Caroline, Katia et Vicky expérimentent pour la toute première fois les joies et aléas du camping traditionnel, en compagnie de leur tendre concubin. Rêvant d'une nature sauvage sous une voûte étoilée, de balades en canot sur un lac miroitant l
Autor:
Michael Quisinsky
Die Aufbrüche im französischen Katholizismus des 20. Jahrhunderts haben spätestens mit dem II. Vatikanum das Bild der katholischen Kirche verändert. Der Dominikanerpater Marie-Dominique Chenu hat viele dieser Entwicklungen – von der historisch