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Etch characteristics of maskless oxide/nitride/oxide/nitride (ONON) stacked structure using C 4 H 2 F 6 -based gas.

Autor: Cho NI; Department of Semiconductor Display Engineering, Sungkyunkwan University, Suwon, Gyeonggi-Do, 16419, Republic of Korea., Hong JW; School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-Do, 16419, Republic of Korea., Yoo HJ; School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-Do, 16419, Republic of Korea., Eoh HJ; SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU), Suwon, Gyeonggi-Do, 16419, Republic of Korea., Kim CH; SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU), Suwon, Gyeonggi-Do, 16419, Republic of Korea., Jeong JW; Department of Semiconductor Convergence Engineering, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-Do, 16419, Republic of Korea., Kim KL; Department of Semiconductor Display Engineering, Sungkyunkwan University, Suwon, Gyeonggi-Do, 16419, Republic of Korea., Kwak JH; Research & Development Department Team, SK Specialty, 130, Myeonghaksandan-Ro, Yeongdong-Myeon, Sejong-Si, 30068, Republic of Korea., Cho YJ; Research & Development Department Team, SK Specialty, 130, Myeonghaksandan-Ro, Yeongdong-Myeon, Sejong-Si, 30068, Republic of Korea., Kim DW; School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-Do, 16419, Republic of Korea. dwkim111@gmail.com., Yeom GY; School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-Do, 16419, Republic of Korea. gyyeom@skku.edu.; SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU), Suwon, Gyeonggi-Do, 16419, Republic of Korea. gyyeom@skku.edu.

Publikováno v: Scientific reports [Sci Rep] 2024 Oct 02; Vol. 14 (1), pp. 22900. Date of Electronic Publication: 2024 Oct 02.