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Autor:
Patrizio CANDELORO(1), Annamaria GERARDINO(2), Enzo Di FABRIZIO(3), Stefano CABRINI(3), Giorgio GIANNINI(2), Luigi MASTROGIACOMO(2), Miguel CIRIA(3), Robert C. O'HANDLEY(3), Gianluca GUBBIOTTI(1), Giovanni CARLOTTI(1)
Publikováno v:
Japanese journal of applied physics 41 (2002): 5149–5152. doi:10.1143/JJAP.41.5149
info:cnr-pdr/source/autori:Patrizio CANDELORO(1), Annamaria GERARDINO(2), Enzo Di FABRIZIO(3), Stefano CABRINI(3), Giorgio GIANNINI(2), Luigi MASTROGIACOMO(2), Miguel CIRIA(3), Robert C. O'HANDLEY(3), Gianluca GUBBIOTTI(1) and Giovanni CARLOTTI(1)/titolo:Patterned magnetic permalloy films: fabrication by e-beam and x-ray lithographic techniques/doi:10.1143%2FJJAP.41.5149/rivista:Japanese journal of applied physics/anno:2002/pagina_da:5149/pagina_a:5152/intervallo_pagine:5149–5152/volume:41
info:cnr-pdr/source/autori:Patrizio CANDELORO(1), Annamaria GERARDINO(2), Enzo Di FABRIZIO(3), Stefano CABRINI(3), Giorgio GIANNINI(2), Luigi MASTROGIACOMO(2), Miguel CIRIA(3), Robert C. O'HANDLEY(3), Gianluca GUBBIOTTI(1) and Giovanni CARLOTTI(1)/titolo:Patterned magnetic permalloy films: fabrication by e-beam and x-ray lithographic techniques/doi:10.1143%2FJJAP.41.5149/rivista:Japanese journal of applied physics/anno:2002/pagina_da:5149/pagina_a:5152/intervallo_pagine:5149–5152/volume:41
Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1 1)mm2. Dot dimensions and spacings range from 500 nm to 1m and from 250
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::e85e60116d797ceb6d34b829b2d4ca2b
http://hdl.handle.net/11391/112429
http://hdl.handle.net/11391/112429