Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Engin Ciftyurek"'
Publikováno v:
Sensors, Vol 23, Iss 1, p 29 (2022)
Oxidation reactions on semiconducting metal oxide (SMOs) surfaces have been extensively worked on in catalysis, fuel cells, and sensors. SMOs engage powerfully in energy-related applications such as batteries, supercapacitors, solid oxide fuel cells
Externí odkaz:
https://doaj.org/article/61032f817a1f468e8bab4902eacd3c4f
Publikováno v:
Proceedings, Vol 14, Iss 1, p 27 (2019)
Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method inwhich high-quality [...]
Externí odkaz:
https://doaj.org/article/82e2b40d2694447cb8b09aa315b1bbac
Autor:
Klaus Schierbaum, Anjana Devi, Jan-Lucas Wree, Aleksander Kostka, Andreas Ostendorf, Nils Boysen, David Zanders, Engin Ciftyurek, Maren Kasischke, Detlef Rogalla
Publikováno v:
Dalton Transactions. 49:13462-13474
Molybdenum disulfide (MoS2) is known for its versatile properties and hence is promising for a wide range of applications. The fabrication of high quality MoS2 either as homogeneous films or as two-dimensional layers on large areas is thus the object
Autor:
Zhongshan Li, Yujiao Li, Klaus Schierbaum, Michael Wark, Alfred Ludwig, Dennis Zywitzki, Daniel M. Baier, Dereje H. Taffa, Jan-Lucas Wree, Raoul Schaper, Detlef Rogalla, Anjana Devi, Engin Ciftyurek, Michael Meischein
Publikováno v:
Zywitzki, D, Schaper, R, Ciftyürek, E, Wree, J L, Taffa, D H, Baier, D M, Rogalla, D, Li, Y, Meischein, M, Ludwig, A, Li, Z, Schierbaum, K, Wark, M & Devi, A 2021, ' Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films : Investigation of Structure and Pseudocapacitive Properties ', Advanced Materials Interfaces, vol. 8, no. 20, 2100949 . https://doi.org/10.1002/admi.202100949
Transition metal ferrites, such as CoFe2O4 (CFO) and NiFe2O4 (NFO), have gained increasing attention as potential materials for supercapacitors. Since chemical vapor deposition (CVD) offers advantages like interface quality to the underlying substrat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f2172adf953d76dad705dc5a9e8affa5
https://pure.au.dk/ws/files/285212173/Adv_Materials_Inter_2021_Zywitzki_Chemical_Vapor_Deposition_of_Cobalt_and_Nickel_Ferrite_Thin_Films_Investigation_of.pdf
https://pure.au.dk/ws/files/285212173/Adv_Materials_Inter_2021_Zywitzki_Chemical_Vapor_Deposition_of_Cobalt_and_Nickel_Ferrite_Thin_Films_Investigation_of.pdf
Autor:
Detlef Rogalla, Anjana Devi, Aleksander Kostka, Ersoy Subaşı, David Zanders, Niklas Huster, Claudia Bock, Engin Ciftyurek, Klaus Schierbaum
Publikováno v:
ACS Applied Materials & Interfaces. 11:28407-28422
A bottom-up approach starting with the development of new Hf precursors for plasma-enhanced atomic layer deposition (PEALD) processes for HfO2 followed by in situ thin-film surface characterization...
Autor:
Claudia Bock, Guido Grundmeier, Teresa de los Arcos, Christian Hoppe, Klaus Schierbaum, Ersoy Subaşı, Anjana Devi, Lukas Mai, Detlef Rogalla, Engin Ciftyurek, David Zanders, Wolfram Gilbert
Publikováno v:
ACS Applied Materials & Interfaces. 11:3169-3180
A bottom-up process from precursor development for tin to plasma-enhanced atomic layer deposition (PEALD) for tin(IV) oxide and its successful implementation in a working thin-film transistor devic...
Autor:
Jan-Lucas, Wree, Engin, Ciftyurek, David, Zanders, Nils, Boysen, Aleksander, Kostka, Detlef, Rogalla, Maren, Kasischke, Andreas, Ostendorf, Klaus, Schierbaum, Anjana, Devi
Publikováno v:
Dalton transactions (Cambridge, England : 2003). 49(38)
Molybdenum disulfide (MoS2) is known for its versatile properties and hence is promising for a wide range of applications. The fabrication of high quality MoS2 either as homogeneous films or as two-dimensional layers on large areas is thus the object
Autor:
Felix Mitschker, Anjana Devi, Peter Awakowicz, Zhongshan Li, Claudia Bock, Engin Ciftyurek, Lukas Mai, Alessia Niesen, Klaus Schierbaum, Detlef Rogalla, Matthias Erig, Johannes Mickler
Publikováno v:
Mai, L, Mitschker, F, Bock, C, Niesen, A, Ciftyurek, E, Rogalla, D, Mickler, J, Erig, M, Li, Z, Awakowicz, P, Schierbaum, K & Devi, A 2020, ' From Precursor Chemistry to Gas Sensors : Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications ', Small, vol. 16, no. 22, 1907506 . https://doi.org/10.1002/smll.201907506
The identification of bis-3-(N,N-dimethylamino)propyl zinc ([Zn(DMP)2], BDMPZ) as a safe and potential alternative to the highly pyrophoric diethyl zinc (DEZ) as atomic layer deposition (ALD) precursor for ZnO thin films is reported. Owing to the int
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cc55a0c1359449dbb60ac65016d2a63b
https://pure.au.dk/ws/files/224577471/smll.201907506.pdf
https://pure.au.dk/ws/files/224577471/smll.201907506.pdf
Autor:
David, Zanders, Engin, Ciftyurek, Ersoy, Subaşı, Niklas, Huster, Claudia, Bock, Aleksander, Kostka, Detlef, Rogalla, Klaus, Schierbaum, Anjana, Devi
Publikováno v:
ACS applied materialsinterfaces. 11(31)
A bottom-up approach starting with the development of new Hf precursors for plasma-enhanced atomic layer deposition (PEALD) processes for HfO