Zobrazeno 1 - 10
of 42
pro vyhledávání: '"Endo, Masataka"'
Autor:
Takaoka, Yousuke, Uchinomiya, Shohei, Kobayashi, Daichi, Endo, Masataka, Hayashi, Takahiro, Fukuyama, Yoshiaki, Hayasaka, Haruko, Miyasaka, Masayuki, Ueda, Takumi, Shimada, Ichio, Hamachi, Itaru
Publikováno v:
In Chem 14 June 2018 4(6):1451-1464
Publikováno v:
In Sedimentary Geology 2005 176(3):247-279
Autor:
ENDO, Masataka
Publikováno v:
アジア太平洋研究センター年報. (12):2-9
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=jairo_______::120753c1037b62ee5042a85492b587f2
https://keiho.repo.nii.ac.jp/records/452
https://keiho.repo.nii.ac.jp/records/452
Autor:
Endo, Masataka
Publikováno v:
アジア太平洋討究. 20:37-51
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=jairo_______::792579308fdcb490151c5dc071285569
http://hdl.handle.net/2065/39134
http://hdl.handle.net/2065/39134
Autor:
Endo, Masataka
Publikováno v:
早稻田政治經濟學雜誌. 376:51-71
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=jairo_______::7d05e0170c148b0d30e61a2b2b7a7ecc
http://hdl.handle.net/2065/31203
http://hdl.handle.net/2065/31203
Autor:
Endo, Masataka
Publikováno v:
早稻田政治經濟學雑誌. 369:143-161
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=jairo_______::7198c175992fb188206c89fd91f0cb84
http://hdl.handle.net/2065/30574
http://hdl.handle.net/2065/30574
Akademický článek
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Autor:
H. Iimori, Mitsuru Ueda, Masaru Sasago, Shinji Ando, Shinji Kishimura, Endo Masataka, Yuji Shibasaki
Publikováno v:
Journal of Photopolymer Science and Technology. 16:601-605
A new photoresist for 157 nm lithography on the basis of poly[(2-hydroxy-3-pinanyl vinyl sulfonate)-co-4-(1, 1, 1, 3, 3, 3-hexafluoro-2-hydroxypropyl)styrene] [poly(VSO3Pina73-co-HFISt27)] and triphenylsulfonium perfluoro-1-butanesulfonate (TPS-Nf) a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57e1dfa35ece53e5be22990adf6255ed
https://doi.org/10.2494/photopolymer.16.601
https://doi.org/10.2494/photopolymer.16.601
Autor:
Masaru Sasago, Shinji Ando, Yuji Shibasaki, Tsuyohiko Fujigaya, Mitsuru Ueda, Shinji Kishimura, Endo Masataka
Publikováno v:
Journal of Photopolymer Science and Technology. 15:643-654
Time-dependent density functional theory (TD-DFT) calculations using the B3LYP hybrid functional suggested that sulfonic acid esters are transparent at around 157nm region. Based on these findings, poly(methyl vinyl sulfonate) [poly(VSO3Me)] was prep
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::479dfbb2f51f6c716a2578e43276ac50
https://doi.org/10.2494/photopolymer.15.643
https://doi.org/10.2494/photopolymer.15.643