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Intra track backside cleaning optimization to reduce the focus spot in Immersion lithography cluster
Autor:
Nathalie Frolet, Emma Porcheron, Karine Jullian, Michael May, Yuji Tanaka, Masahiko Harumoto, Raluca Tiron
Publikováno v:
Advances in Patterning Materials and Processes XXXIX.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8cf9c0d8b8cae4e77893a6b26d0d8a3d
https://doi.org/10.1117/12.2614242
https://doi.org/10.1117/12.2614242
