Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Emma Brouk"'
Dimensionally and thermally stable polymer, containing disordered graphitic structure and adamantane
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 44:6909-6925
In an attempt to develop a low-k interlayer dielectric, adamantane-diphenyldiethynyl moiety containing oligomer is prepared. Oligomerization of 1,3,5,7-tetrakis[3/4-ethynylphenyl]adamantane (4) is accomplished by a Glaser–Hay oxidative coupling wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::56eff083f964f8ef77e75d3afd317277
https://doi.org/10.1002/pola.21788
https://doi.org/10.1002/pola.21788
Autor:
Mehari Stifanos, Amanuel Gebrebrhan, Nancy Iwamoto, Ahila Krishnamoorthy, Deborah Yellowaga, Edward W. Rutter, Richard Spear, Emma Brouk
Publikováno v:
EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems.
Molecular modeling was employed to understand various properties found in thick film dielectric layers derived from solution-based sol-gel formulation in order to aid their development. For instance, for formulations used as planarizing layers, it wa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::165a453c62879d4818def614b5949957
https://doi.org/10.1109/esime.2008.4525101
https://doi.org/10.1109/esime.2008.4525101
Autor:
Emma Brouk, Brian J. Daniels, Mehari Stifanos, Ahila Krishnamoorthy, Peter Smith, Jinghong Chen, Jan Nedbal
Publikováno v:
MRS Proceedings. 936
We present recent advances on spin-on polymers as gate dielectric for thin film transistors. We have developed film type I with significantly improved dielectric properties. At a curing temperature of 250 °C, the dielectric constant is 3.46, the bre
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c85e2c7216ad37b618f72e7ee070f871
https://doi.org/10.1557/proc-0936-l11-03
https://doi.org/10.1557/proc-0936-l11-03
Autor:
Roger Y. Leung, Emma Brouk, Tiffany Nguyen, Wenya Fan, Jason Stuck, Jaswinder Gill, Songyuan Xie, Bo Li, Nancy Iwamoto, Shilpa Thanawala, Joseph Kennedy, Faith Zhou, Lei Jin, Kim Do
Publikováno v:
SPIE Proceedings.
A spin-on sacrificial 193 nm UV absorbing organosiloxane film was developed to facilitate ArF photoresist (PR) patterning. To improve lithographic compatibility with acrylate based photoresists, different performance additives were evaluated as photo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4913d6a57ea5e7303ae6129d22fd8548
https://doi.org/10.1117/12.600015
https://doi.org/10.1117/12.600015
Autor:
Ahila Krishnamoorthy, Mehari Stifanos, Wenya Fan, Jinghong Chen, Jeff Rose, Brian J. Daniels, Jan Nedbal, Emma Brouk, Peter Smith
Publikováno v:
SID Symposium Digest of Technical Papers. 37:1878
We present spin-on polymer films with significantly improved dielectric properties for TFT gate dielectric applications. Breakdown voltage//leakage current//CV hysteresis are 4.10 MV/cm at 1 μA/cm2//4.9 × 10−8 A/cm2 at 2.5 MV/cm//3.4 V and 4.73 M
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8cc69fd11e17e4e17c2b2ec0a2135997
https://doi.org/10.1889/1.2433412
https://doi.org/10.1889/1.2433412