Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Emilienne Fadda"'
Publikováno v:
Microelectronic Engineering. 30:593-596
The application of the contact angle measurement technique to lithographic processes is investigated through three examples namely, the structure of basic pure Novolak polymers, the monitoring of the latent image of DNQ-Novolak systems and the deprot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3609152d443a4edeaa3e7e0386382b06
https://doi.org/10.1016/0167-9317(95)00317-7
https://doi.org/10.1016/0167-9317(95)00317-7
Publikováno v:
SPIE Proceedings.
Bakes are important steps in lithographic processes. In this work, bake mechanisms are studied using the contact angle measurement (CAM) technique on pure novolak spin-coated films. Both the dispersive and basic components of the surface energy are m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::74fcda4fc003b22c68566ef134c861e6
https://doi.org/10.1117/12.241844
https://doi.org/10.1117/12.241844
Publikováno v:
Advances in Resist Technology and Processing XI.
The resist processes used for optical lithography are mainly positive tone, based on the use of DNQ/novolac photoresists. It has been demonstrated that enhancing the resist pattern profiles is possible by optimization of the development step. Develop
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c7d0fd1401e2ffdc41b5aa4617b6c56
https://doi.org/10.1117/12.175371
https://doi.org/10.1117/12.175371
Publikováno v:
Annales Des Télécommunications. 51:290-290
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a77ef897d0f5e573f713665ed71953e0
https://doi.org/10.1007/bf02999808
https://doi.org/10.1007/bf02999808
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