Výsledky vyhledávání - "Emilia W. Hirsch"

Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma

Autor: Emilia W. Hirsch, Linfeng Du, Demetre J. Economou, Vincent M. Donnelly

Publikováno v: Journal of Vacuum Science & Technology A. 38:023009

Etching of p-Si in 60 mTorr 10%Cl2/90%Ar Faraday-shielded inductively coupled high density plasmas was investigated under both ion-assisted etching (IAE) and photoassisted etching (PAE) conditions. Real-time etching rates and after-etching Si surface

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::57f8f0334cea0c4e81caeebb9c3fd9d5
https://doi.org/10.1116/1.5138189

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Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy

Autor: Emilia W. Hirsch, Lei Liu, Demetre J. Economou, Vincent M. Donnelly, Shyam Sridhar

Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 34:061303

Various mechanisms have been proposed to explain photo-assisted etching (PAE) of Si, including photogenerated carrier-mediated etching, photon-stimulated desorption, and photon-induced damage (breaking of Si–Si bonds) caused mainly by vacuum ultrav

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::846d7105326641f04fb58dc7b498fe33
https://doi.org/10.1116/1.4964641

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