Zobrazeno 1 - 10
of 22
pro vyhledávání: '"Elshad Guliyev"'
Autor:
Tzvetan Ivanov, Ahmad Ahmad, Mathias Holz, Ho-Se Lee, Ivo W. Rangelow, Alexander Reum, Christoph Reuter, Elshad Guliyev
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
Atomic Force Microscopy (AFM) is a capable to provide high resolution CD-metrology and precise defects analysis on large wafers, masks or displays. However, AFM is not enough productive for high-throughput industrial uses. Standard single probe AFMs
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cea47eb9d7ea385d52821fdb902c788a
https://doi.org/10.1117/12.2515091
https://doi.org/10.1117/12.2515091
Autor:
Marcus Kaestner, Eberhard Manske, Ahmad Ahmad, Roland Fuessl, Mahmut Bicer, Ivo W. Rangelow, Claudia Lenk, Christoph Reuter, Steve Lenk, Mathias Holz, Alexander Reum, B. Erdem Alaca, Zahid A. K. Durrani, Tzvetan Ivanov, Elshad Guliyev, Michael Kuehnel, Matthias Budden, Thomas Fröhlich, Jens-Peter Zöllner, Cemal Aydogan, Martin Hofmann, Mervyn Jones
Publikováno v:
Proceedings of SPIE-The International Society for Optical Engineering
Cost-effective generation of single-digit nano-lithographic features could be the way by which novel nanoelectronic devices, as single electron transistors combined with sophisticated CMOS integrated circuits, can be obtained. The capabilities of Fie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e2b11d5dc22fac15eb5a404c4ef5bd2c
https://doi.org/10.1117/12.2299955
https://doi.org/10.1117/12.2299955
Autor:
Claudia Lenk, Ivo W. Rangelow, Tzvetan Ivanov, Hamdi Torun, Steve Lenk, Cemal Aydogan, Elshad Guliyev, Marcus Kaestner, B. Erdem Alaca, Arda D. Yalcinkaya, Martin Hofmann, Mahmut Bicer, Mathias Holz, Alexander Reum, Onur Ates, Ahmad Ahmad
Publikováno v:
Nanophotonics Australasia 2017.
Next-generation electronic and optical devices demand high-resolution patterning techniques and high-throughput fabrication. Thereby Field-Emission Scanning Probe Lithography (FE-SPL) is a direct writing method that provides high resolution, excellen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f06f8019f6f889ea612409fe226ff54
https://doi.org/10.1117/12.2282606
https://doi.org/10.1117/12.2282606
Autor:
Tzvetan Ivanov, Teodor Gotszalk, Ivo W. Rangelow, Daniel Kopiec, Maciej Rudek, Elshad Guliyev, Manuel Hofer
Publikováno v:
Microelectronic Engineering. 145:32-37
The following two pictures show the fabricated thermally sensitive sensor (left) having a FIB modified sharp metallized cantilever tip. The second picture (right) shows the principle which is used to measure the temperature above a sample (after the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::576fe5f7aa793471adcfce896aa58220
https://doi.org/10.1016/j.mee.2015.02.016
https://doi.org/10.1016/j.mee.2015.02.016
Autor:
Valentyn Ishchuk, N. Nikolov, Ivo W. Rangelow, Thomas Glinsner, Marcus Kaestner, Steve Lenk, Ahmad Ahmad, Alexander Reum, Elshad Guliyev, Ivan Buliev, Tzvetan Ivanov, Claudia Lenk, Cemal Aydogan
Publikováno v:
Applied Physics A. 123
Overlay alignment is a concern for nanolithography applications, in particular, for those using step and repeat techniques targeting next-generation lithographic applications. In this context, a new method and a proof of concept (POC) setup for accur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6797cc1e435a7ec7590a01bd84b2d3fc
https://doi.org/10.1007/s00339-016-0681-8
https://doi.org/10.1007/s00339-016-0681-8
Publikováno v:
Microelectronic Engineering. 98:520-523
Graphical abstractDisplay Omitted Highlights? Fast SPM. ? High speed quasi-monolithic silicon/piezostack SPM scanning stage. ? High frequency self-actuated, self-sensing SPM-Cantilever. ? High performance miniaturized SPM system. ? Piezoresistive rea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1fa14701461b96ab0ce2768a954bff87
https://doi.org/10.1016/j.mee.2012.07.059
https://doi.org/10.1016/j.mee.2012.07.059
Autor:
Tzvetan Ivanov, Mathias Holz, Ivo W. Rangelow, Martin Hofmann, Mahmoud Behzadirad, Elshad Guliyev, Daniel F. Feezell, Steve Lenk, Claudia Lenk, Tito Busani, Ashwin K. Rishinaramangalam
Publikováno v:
Journal of Vacuum Science & Technology B. 36:06JL03
The patterning process in field-emission scanning probe lithography (FE-SPL), a high-resolution and cost-effective method for nanofabrication, is based on the field emission of electrons from ultrasharp tips in close proximity to a sample (distances
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b90eca23ea87845223cd9667515afc54
https://doi.org/10.1116/1.5048518
https://doi.org/10.1116/1.5048518
Autor:
Ivo W. Rangelow, Steve Lenk, Christoph Reuter, Claudia Lenk, Tzvetan Ivanov, N. Nikolov, Mathias Holz, Marcus Kaestner, Alexander Reum, Ahmad Ahmad, Martin Hofmann, Elshad Guliyev
Publikováno v:
Journal of Vacuum Science & Technology B. 36:06JL06
The development of next nodes of nano-electronic devices requires mask-less techniques for fast prototyping and analysis of ultimately down-scaled devices or for fabrication of templates for nanoimprint based high-volume manufacturing. Moreover, the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d1316b583bb60531e5abb72b1c6c6ccd
https://doi.org/10.1116/1.5048357
https://doi.org/10.1116/1.5048357
Autor:
Steve Lenk, Christoph Reuter, Marcus Kaestner, Tzvetan Ivanov, Claudia Lenk, Elshad Guliyev, Ivo W. Rangelow, Mathias Holz, Alexander Reum, Ahmad Ahmad, Martin Hofmann
Publikováno v:
Journal of Vacuum Science & Technology B. 36:06J102
More than 40 years after its invention, the atomic force microscopy (AFM) can be integrated with scanning electron microscope (SEM) instruments as an increasingly capable and productive characterization tool with sub-nanometer spatial resolution. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39b7bdefc11fc49aa33c92de4fb1b202
https://doi.org/10.1116/1.5048524
https://doi.org/10.1116/1.5048524
Autor:
Arun Persaud, Ivo W. Rangelow, K. Ivanova, Tzv. Ivanov, Elshad Guliyev, B. E. Volland, Y. Sarov, S. Klett, Jens-Peter Zöllner, Ivan Kostic
Publikováno v:
Microelectronic Engineering. 84:1329-1332
A thermally actuated micro gripper with two integrated micro actuators for open/close action was designed and fabricated from single crystal silicon. A total gripping range of [email protected] was observed for driving voltages below 5V. The actuatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ecc592426d9af495a15c46c39f1cf11f
https://doi.org/10.1016/j.mee.2007.01.177
https://doi.org/10.1016/j.mee.2007.01.177