EUV near normal incidence collector development at SAGEM

Autor: R. Mercier Ythier, Andre Rinchet, Benoit Sassolas, Jean-Marie Mackowski, Marie-Françoise Ravet-Krill, Christophe Michel, Roland Geyl, Laurent Pinard, Elodie Roméo, Xavier Bozec, R. Flaminio, Christophe Hecquet, N. Morgado, Franck Delmotte, J.-L. Montorio

Publikováno v: Proc. SPIE 6921, Emerging Lithographic Technologies XII
Emerging lithographic technologies XII
Emerging lithographic technologies XII, Feb 2008, San José, United States. pp.692135, ⟨10.1117/12.787620⟩

Through its participation to European programs, SAGEM has worked on the design and manufacturing of normal incidence collectors for EUV sources. By opposition to grazing incidence, normal incidence collectors are expected to collect more light with a

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c3ab7889d7c5ab5eac620f815f42bc4d
https://hal-iogs.archives-ouvertes.fr/hal-00814125