Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Elizabeth Lofano"'
Autor:
Daniel P. Sanders, Kristin Schmidt, Elizabeth Lofano, Gabriela Alva, Anindarupa Chunder, Ankit Vora, Jed W. Pitera, Teddie Magbitang, Joy Cheng, Noel Arellano, Leslie E. Thompson
Publikováno v:
ACS Applied Materials & Interfaces. 8:29808-29817
Orientation control of thin film nanostructures derived from block copolymers (BCPs) are of great interest for various emerging technologies like separation membranes, nanopatterning, and energy storage. While many BCP compositions have been develope
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::383b900b1e1d9c7d93730e04e9689dc6
https://doi.org/10.1021/acsami.6b11293
https://doi.org/10.1021/acsami.6b11293
Autor:
Daniel P. Sanders, Elizabeth Lofano, Anindarupa Chunder, Kristin Schmidt, Joy Cheng, Gabriela Alva, Noel Arellano, Teddie Magbitang, Ankit Vora
Publikováno v:
Journal of Photopolymer Science and Technology. 29:685-688
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17efdde3c5ea976e0b5594d22067bef3
https://doi.org/10.2494/photopolymer.29.685
https://doi.org/10.2494/photopolymer.29.685
Autor:
Teddie Magbitang, Ankit Vora, Joy Cheng, Kristin Schmidt, Daniel P. Sanders, Khanh Nguyen, Melia Tjio, Noel Arellano, Anindarupa Chunder, Elizabeth Lofano
Publikováno v:
Journal of Photopolymer Science and Technology. 28:659-662
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d492e0ae64201bb1b3d74ecf36117232
https://doi.org/10.2494/photopolymer.28.659
https://doi.org/10.2494/photopolymer.28.659
Autor:
Durairaj Baskaran, Yasushi Akiyama, Orest Polishchuk, Guanyang Lin, SungEun Hong, Anindarupa Chunder, Margareta Paunescu, Joy Cheng, Ankit Vora, Eri Hirahara, Melia Tjio, Elizabeth Lofano, Daniel P. Sanders, Srinivasan Balakrishman
Publikováno v:
Journal of Photopolymer Science and Technology. 27:419-424
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b366c95c2d4f3dda7f810d3e575e5a35
https://doi.org/10.2494/photopolymer.27.419
https://doi.org/10.2494/photopolymer.27.419
Autor:
Leslie E. Thompson, Anthony Fong, Sogol Yahyazadeh, Younes Ansari, Kumar Virwani, Elizabeth Lofano, Young-Hye La, Robert D. Miller
Publikováno v:
Advanced Energy Materials. 8:1802603
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f4f7bf1ef55495ba91f6d494c1bc66dc
https://doi.org/10.1002/aenm.201802603
https://doi.org/10.1002/aenm.201802603
Autor:
Margareta Paunescu, Anindarupa Chunder, Khanh Nguyen, Noel Arellano, Jihoon Kim, Hsinyu Tsai, Orest Polishchuk, Ankit Vora, Eri Hirahara, Durairaj Baskaran, Edward Ng, Guanyang Lin, SungEun Hong, Chi-Chun Liu, EunJeong Jeong, Charles T. Rettner, Elizabeth Lofano, Joy Cheng, A. N. Bowers, Jianhui Shan, Alexander Friz, Daniel P. Sanders, Melia Tjio, Srinivasan Balakrishnan
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
To extend scaling beyond poly(styrene-b-methyl methacrylate) (PS-b-PMMA) for directed self-assembly (DSA), high quality organic high-x block copolymers (HC series) were developed and applied to implementation of sub-10 nm L/S DSA. Lamellae-forming bl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e33e10a9062cd8e4e79700ecd2d8874f
https://doi.org/10.1117/12.2087398
https://doi.org/10.1117/12.2087398
Autor:
Charles T. Rettner, Yoshio Kawai, Satoshi Watanabe, Luisa D. Bozano, Takayuki Nagasawa, Gustavo Gandara Montano, Nagarajan Palavesam, Martha I. Sanchez, Linda K. Sundberg, Elizabeth Lofano, Ratnam Sooriyakumaran
Publikováno v:
SPIE Proceedings.
Electron beam resists develop a surface potential during exposure that can lead to image placement errors of up to several nanometers [1] and cause poor CD uniformity and image quality. To address this problem, we have formulated a conductive polymer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bd8115a6d08a412b143c7526c413b228
https://doi.org/10.1117/12.916756
https://doi.org/10.1117/12.916756
Autor:
Elizabeth Lofano, Linda K. Sundberg, Masaki Fujiwara, Hiroshi Ito, Kazuhiro Yamanaka, Yoshiharu Terui, Luisa D. Bozano
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
Classical electron-beam resists such as poly(methyl methacrylate) (PMMA) and Nippon Zeon's ZEP function as high resolution and low roughness positive resists on the basis of radiation induced main chain scission to reduce the molecular weight while c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::86352c5edf89eb31d47d4781b203be7d
https://doi.org/10.1117/12.813352
https://doi.org/10.1117/12.813352