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pro vyhledávání: '"Elina Sahramo"'
Publikováno v:
THIN SOLID FILMS. 519(16):5319-5322
Low-temperature atomic layer deposition (ALD) processes are intensely looked for to extend the usability of the technique to applications where sensitive substrates such as polymers or biological materials need to be coated by high-quality thin films
Publikováno v:
Chemistry of Materials. 22:3349-3352
Here we explore the possibility of affecting the photoinduced wetting properties of nanostructures with tiny amounts of an inorganic modifier. Cicada wings are coated with a thin layer of ZnO by atomic layer deposition (ALD). We show that a few atomi
Autor:
Elina Sahramo, Jari Malm, Maarit Karppinen, Robin H. A. Ras, Antti Hakola, Ville Kekkonen, Timo Kajava
Publikováno v:
Kekkonen, V, Hakola, A, Kajava, T, Sahramo, E, Malm, J, Karppinen, M & Ras, R H A 2010, ' Self-erasing and rewritable wettability patterns on ZnO thin films ', Applied Physics Letters, vol. 97, 44102 . https://doi.org/10.1063/1.3460915
Self-erasing patterns allow a substrate to be patterned multiple times or could store temporary information for secret communications, and are mostly based on photochromic molecules to change the color of the pattern. Herein we demonstrate self-erasi
Publikováno v:
Journal of the American Chemical Society. 130(34)
Area-selective atomic layer deposition (ALD) allows the growth of highly uniform thin inorganic films on certain parts of the substrate while preventing the film growth on other parts. Although the selective ALD growth is working well at the micron a
Publikováno v:
Chemistry of Materials; Jun2010, Vol. 22 Issue 11, p3349-3352, 4p