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pro vyhledávání: '"Elias ML"'
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Autor:
Burshtein J; Department of Dermatology, Icahn School of Medicine at Mount Sinai, New York, New York., Elias ML; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York., Sharon VR; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York.
Publikováno v:
Dermatologic surgery : official publication for American Society for Dermatologic Surgery [et al.] [Dermatol Surg] 2025 Jan 01; Vol. 51 (1), pp. 102-103. Date of Electronic Publication: 2024 Jul 23.
Autor:
Behbahani S; Department of Pathology, Rutgers New Jersey Medical School, Newark NJ., Skula S; Department of Pathology, Rutgers New Jersey Medical School, Newark NJ., Elias ML; Department of Pathology, Rutgers New Jersey Medical School, Newark NJ., Patel S; Department of Pathology, Rutgers New Jersey Medical School, Newark NJ., Shah R; Department of Pathology, Rutgers New Jersey Medical School, Newark NJ., Espinal-Mariotte JD; Ideal Labs, LLC., Schwarz RA; Department of Pathology and Laboratory Medicine and Department of Dermatology, Rutgers New Jersey Medical School, Newark NJ., Lambert WC; Department of Pathology and Laboratory Medicine and Department of Dermatology, Rutgers New Jersey Medical School, Newark NJ; wclambert3129@gmail.com.
Publikováno v:
Skinmed [Skinmed] 2024 Dec 31; Vol. 22 (6), pp. 454-457. Date of Electronic Publication: 2024 Dec 31 (Print Publication: 2024).
Autor:
Elias ML; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, NY, USA., Burshtein J; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, NY, USA., Sharon VR; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, NY, USA.
Publikováno v:
International journal of dermatology [Int J Dermatol] 2024 Jan; Vol. 63 (1), pp. 73-78. Date of Electronic Publication: 2023 Dec 22.
Autor:
Elias ML; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York, USA., Gottesman SP; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York, USA., Sharon VR; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York, USA.
Publikováno v:
International journal of dermatology [Int J Dermatol] 2023 Oct; Vol. 62 (10), pp. e567-e569. Date of Electronic Publication: 2023 Apr 24.
Autor:
Elias ML; From the Department of Dermatology, Northwell Health, North New Hyde Park, New York, United States., Israeli AF; From the Department of Dermatology, Northwell Health, North New Hyde Park, New York, United States., Madan R; From the Department of Dermatology, Northwell Health, North New Hyde Park, New York, United States.
Publikováno v:
Indian journal of dermatology [Indian J Dermatol] 2023 Sep-Oct; Vol. 68 (5), pp. 546-550.
Autor:
Elias ML; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, NY, USA., Koptyev J; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, NY, USA., Yan BY; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, NY, USA., Strunk A; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, NY, USA., Sharon VR, Garg A; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, NY, USA.
Publikováno v:
Clinical and experimental dermatology [Clin Exp Dermatol] 2023 Aug 25; Vol. 48 (9), pp. 1044-1046.
Autor:
Elias ML; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, Hempstead, New York, USA., Yan BY; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, Hempstead, New York, USA., Koptyev J; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, Hempstead, New York, USA., Strunk A; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, Hempstead, New York, USA., Garg A; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, Hempstead, New York, USA., Sharon VR; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, Hempstead, New York, USA.
Publikováno v:
International journal of dermatology [Int J Dermatol] 2023 Apr; Vol. 62 (4), pp. e253-e255. Date of Electronic Publication: 2022 Aug 10.
Autor:
Yan BY; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York., Elias ML; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York., Duvvuri P; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York., Strunk A; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York., Garg A; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York., Sharon VR; Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York. Electronic address: vsharon@northwell.edu.
Publikováno v:
Journal of the American Academy of Dermatology [J Am Acad Dermatol] 2023 Mar; Vol. 88 (3), pp. 700-702. Date of Electronic Publication: 2022 Sep 02.
Autor:
Elias ML; All authors are affiliated with the Department of Dermatology, Donald and Barbara Zucker School of Medicine at Hofstra/Northwell, New Hyde Park, New York., Burshtein JG, Barilla S, Sharon VR
Publikováno v:
Dermatologic surgery : official publication for American Society for Dermatologic Surgery [et al.] [Dermatol Surg] 2023 Jan 01; Vol. 49 (1), pp. 105-106. Date of Electronic Publication: 2022 Nov 29.