Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Elias Laforge"'
Publikováno v:
32nd European Mask and Lithography Conference.
In recent years, increased demand for high aspect ratio MEMS structures has driven the need for thick photoresist fabrication processes. In this work, the optimization of a thick photoresist process using a negative tone resist (THB-151N) is describe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9c962bcb578f036ebb56bc9c2cf3878
https://doi.org/10.1117/12.2247899
https://doi.org/10.1117/12.2247899
High-aspect-ratio photoresist processing for fabrication of high resolution and thick micro-windings
Publikováno v:
Journal of Micromechanics and Microengineering. 26:105012
DC winding losses remain a major roadblock in realizing high efficiency micro-magnetic components (inductors/transformers). This paper reports an optimized photoresist process using negative tone and acrylic based THB-151N (from JSR Micro), to achiev
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2192d948bced7f39a56079657b3679cf
https://doi.org/10.1088/0960-1317/26/10/105012
https://doi.org/10.1088/0960-1317/26/10/105012
Publikováno v:
Journal of Micromechanics & Microengineering; Oct2016, Vol. 26 Issue 10, p1-1, 1p