Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Elfi van Zeijl"'
Autor:
Maarten van Es, Selman Tamer, Elin Bloem, Laurent Fillinger, Elfi van Zeijl, Klára Maturová, Jacques van der Donck, Rob Willekers, Adam Chuang, Diederik Maas
Publikováno v:
Micro and Nano Engineering, Vol 19, Iss , Pp 100181- (2023)
Patterning photoresist with extreme control over dose and placement is the first crucial step in semiconductor manufacturing. However, how can the activation of modern complex resist components be accurately measured at sufficient spatial resolution?
Externí odkaz:
https://doaj.org/article/0653850e95f944f287663f12ba7a92af
Autor:
Maarten H. van Es, Mehmet Selman . Tamer, Robbert Bloem, Elfi van Zeijl, Jacques C. J. Verdonck, Adam Chuang, Diederik J. Maas
Publikováno v:
Advances in Patterning Materials and Processes XXXIX.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3618f2492d91d16ae0a535be047cb236
https://doi.org/10.1117/12.2614293
https://doi.org/10.1117/12.2614293
Autor:
Maarten van Es, Mehmet Tamer, Robbert Bloem, Laurent Fillinger, Elfi van Zeijl, Klára Maturová, Jacques van der Donck, Rob Willekers, Diederik Maas
Patterning photoresist with extreme control over dose and placement is the first crucial step in semiconductor manufacturing. However, how can the activation of modern complex resist components be accurately measured at sufficient spatial resolution?
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3a700cab3f497d3ad392c57bf97ae51
https://doi.org/10.21203/rs.3.rs-1238936/v2
https://doi.org/10.21203/rs.3.rs-1238936/v2
