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pro vyhledávání: '"Eleni Psari"'
Autor:
Jo Finders, Sander Wuister, Thorsten Last, Gijsbert Rispens, Eleni Psari, Jan Lubkoll, Eelco van Setten, Friso Wittebrood
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII
0.33 NA EUV lithography is expected to be introduced into High Volume Manufacturing at k1 values of approximately 0.4...0.5. This is significantly larger than state of the art immersion lithography which can operate at k1 of 0.3. We investigated the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4a47852bed4de9833af59f65ab29aa2d
