Inhomogeneous rarefaction of the process gas in a direct current magnetron sputtering system.

Autor: Jimenez, F., Ekpe, S. D., Dew, S. K.

Publikováno v: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2006, Vol. 24 Issue 4, p1530-1534, 5p, 1 Diagram, 1 Chart, 4 Graphs