All Wet Photoresist Strip by Solvent Aerosol Spray

Autor: Wada, Masayuki, Sano, Kenichi, Snow, James, Vos, Rita, Leunissens, L.H.A., Mertens, Paul W., Eitoku, Atsuro

Publikováno v: Diffusion and Defect Data Part B: Solid State Phenomena; January 2009, Vol. 145 Issue: 1 p285-288, 4p

Application of Single-Wafer Wet Cleaning Prior to Epitaxial SiGe Process

Autor: Sano, Kenichi, Wada, Masayuki, Leys, Frederik E., Loo, Roger, Hikavyy, Andriy, Mertens, Paul W., Snow, James, Izumi, Akira, Miya, Katsuhiko, Eitoku, Atsuro

Publikováno v: Diffusion and Defect Data Part B: Solid State Phenomena; January 2009, Vol. 145 Issue: 1 p173-176, 4p

Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe

Autor: Sano, Kenichi, Leys, Frederik E., Dilliway, G., Loo, Roger, Mertens, Paul W., Snow, James, Izumi, Akira, Eitoku, Atsuro

Publikováno v: Diffusion and Defect Data Part B: Solid State Phenomena; November 2007, Vol. 134 Issue: 1 p243-246, 4p

Removal of Nano-Particles by Mixed-Fluid Jet: Evaluation of Cleaning Performance and Comparison with Megasonic

Autor: Vereecke, Guy, Veltens, T., Eitoku, Atsuro, Sano, Kenichi, Doumen, G., Fyen, Wim, Wostyn, Kurt, Snow, James, Mertens, Paul W.

Publikováno v: Diffusion and Defect Data Part B: Solid State Phenomena; November 2007, Vol. 134 Issue: 1 p193-196, 4p

Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer

Autor: Sano, Kenichi, Izumi, Akira, Eitoku, Atsuro, Snow, James, Nyns, L., Kubicek, S., Singanamalla, R., Richard, O., Conard, Thierry, Vos, Rita, Mertens, Paul W.

Publikováno v: Diffusion and Defect Data Part B: Solid State Phenomena; November 2007, Vol. 134 Issue: 1 p53-56, 4p