Zobrazeno 1 - 10
of 28
pro vyhledávání: '"Eiji Iwamura"'
Publikováno v:
AIMS Materials Science, Vol 5, Iss 4, Pp 756-769 (2018)
Heat dissipation for electronic devices has attracted extensive interest because the reliability, lifetime, and performance are seriously affected by temperature increases during the operation. The effects of inorganic fillers in heat dissipation coa
Externí odkaz:
https://doaj.org/article/80c7b2f3f98e430c826157cec94899e4
Autor:
Eiji Iwamura
Publikováno v:
Materia Japan. 54:607-611
Publikováno v:
Surface and Coatings Technology. 203:794-798
Nano-lamination is a new way to make full use of multi-layered structure for coating instead of the mono-layered coating system. Different from the conventional nano-lamination approach, where two different kinds of material system are deposited in l
Publikováno v:
Journal of Materials Science. 43:6159-6166
Electrical beam (EB) irradiation is used to chemically modify the amorphous carbon film, a-C:H, which is prepared by the DC magnetron sputtering. The starting a-C:H film has vague columnar structure with lower density intercolumns as predicted by Tho
Publikováno v:
Surface and Coatings Technology. 202:1177-1181
In parallel with down-sizing of electrical devices and products, manufacturing is forced to be also miniatured to fabricate small-sized electrical parts with the geometric size in millimeters. This type of micro-stamping, suffers from two issues: sta
Autor:
Eiji IWAMURA
Publikováno v:
Journal of The Surface Finishing Society of Japan. 58:260-266
Autor:
Eiji Iwamura
Publikováno v:
Materia Japan. 41:635-643
Publikováno v:
Thin Solid Films. 349:191-198
The effect of surface oxide layers on thermally induced hillock formation was examined in AlTa and AlCu alloy films. An anodic oxide or a sputter-deposited oxide layer was intentionally formed on the top of the Al alloy films, and subsequently anneal
Publikováno v:
Thin Solid Films. 340:306-316
Morphology of Al–2.0at%Ta and Al–2.0 at.% Nd alloy films before and after annealing was investigated for applications of interconnections for liquid crystal displays. It was found that the morphology and the microstructure of Al–2.0 at.% Nd all
Publikováno v:
Journal of the Surface Finishing Society of Japan. 50:52-57
The temperature dependence of metal nitride thermal stress was measured up to 500°C using a high-temperature thin film stress system (Tencor F2400), and primary results for TiN, CrN, Cr2N, and AlTiN were presented. A series of metal nitrides-TiN, Cr